公开(公告)号：US20160372305A1

公开(公告)日：2016-12-22

申请号：US15050685

申请日：2016-02-23

Applicant: Hitachi High-Technologies Corporation

Inventor： Takashi UEMURA ,  Susumu TAUCHI ,  Kohei SATOU

IPC: H01J37/32

Abstract: A plasma processing apparatus has a vacuum container having a processing chamber in which a wafer is processed by plasma and at least one member constituting the vacuum container movable and detachable in a horizontal direction with respect to a base plate. The plasma processing apparatus includes a lifter arranged at a side of the vacuum container across the vacuum container on the base plate, coupled to an end portion on the opposite side of a vacuum transfer chamber on which the wafer is transferred in a decompressed interior, and having a vertical shaft to move the detachable member vertically. The lifter includes: a coupling portion coupled to the vertical shaft and the detachable member and moved along the vertical shaft; and a turning shaft being a joint portion arranged at the coupling portion and having a vertical rotational shaft, the detachable member being horizontally turned around the turning shaft.

Abstract translation: 等离子体处理装置具有真空容器，该真空容器具有处理室，其中通过等离子体处理晶片，并且构成真空容器的至少一个构件相对于基板在水平方向上可移动和拆卸。 等离子体处理装置包括一个升降机，该升降器布置在真空容器的一侧，穿过基板上的真空容器，该升降器与真空传送室的相反侧的端部连接，真空传送室上的晶片被转移到减压内部， 具有垂直轴以垂直地移动可拆卸构件。 升降机包括：耦合部分，其联接到垂直轴和可拆卸构件并沿着竖直轴移动; 以及转轴，其是设置在所述联接部上并具有垂直旋转轴的接合部，所述可拆卸构件围绕所述转动轴水平转动。