公开(公告)号：US20190311875A1

公开(公告)日：2019-10-10

申请号：US16354670

申请日：2019-03-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Wataru YAMANE ,  Minoru YAMAZAKI ,  Yuko SASAKI ,  Wataru MORI ,  Takashi DOI

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/22 ,  H01J37/28 ,  H01J37/10

Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.