公开(公告)号：US06530998B1

公开(公告)日：2003-03-11

申请号：US09702746

申请日：2000-11-01

Applicant: Hitoshi Oofune

Inventor： Hitoshi Oofune

IPC: C23C810

CPC classification number: A63B53/04 ,  A63B53/0466 ,  A63B53/047 ,  A63B2053/0416 ,  A63B2053/0445 ,  A63B2209/00 ,  C22C33/003 ,  C22C45/005 ,  C22C45/08 ,  C22C45/10 ,  C23C8/10 ,  C23C8/24 ,  G02B6/3854 ,  G02B6/3874 ,  Y02T50/67

Abstract: A ceramic hard layer is formed on the surface of a formed article by subjecting the formed article of a substantially amorphous alloy to a heat treatment in an atmosphere containing a reactive gas under the conditions of temperature and time falling within the amorphous region in the isothermal transformation curve (TTT curve) of the alloy. The heat treatment is carried out, for instance, in an atmosphere containing oxygen and/or nitrogen at a concentration of not less than 1 ppm or in the air at a temperature of not less than the lowest temperature required for the oxidation or nitriding reaction of at least one component element of the matrix material. By this heat treatment, it is possible to produce a ceramic hard layer on the surface of the article in such a manner that the content of oxide and/or nitride gradually decreases in the depth direction.

Abstract translation: 在成型体的表面上，通过在等温转变的温度和时间落入非晶区域的条件下，对含有反应性气体的气氛进行热处理，在成型体的表面上形成陶瓷硬质层 曲线（TTT曲线）。 热处理例如在含有浓度为1ppm以上的氧气和/或氮气的气氛中，或在不低于氧化或氮化反应所需的最低温度的空气中进行， 基质材料的至少一种组分元素。 通过这种热处理，可以以使得氧化物和/或氮化物的含量在深度方向上逐渐减小的方式在制品的表面上产生陶瓷硬质层。