公开(公告)号：US06416677B1

公开(公告)日：2002-07-09

申请号：US09585785

申请日：2000-06-05

申请人： Hsiang-Yi Wei ,  Yi-Ting Yao ,  Eiki Narumi ,  Chyu-Jiuh Torng ,  Cherng-Chyi Han

发明人： Hsiang-Yi Wei ,  Yi-Ting Yao ,  Eiki Narumi ,  Chyu-Jiuh Torng ,  Cherng-Chyi Han

IPC分类号： B44C122

CPC分类号： G11B5/37

摘要： As the read capabilities of magnetic disk systems improve due to advanced GMR heads, it becomes necessary to correspondingly reduce the area of recorded data. This requires a narrowing of the stitched sub-pole at the write gap. This has proved difficult for pole widths less than about 0.4 microns because of problems in filling the mold. In the present invention this is overcome by introducing a layer of PMGI (polydimethylglutarimide) between the planarized positive photoresist layer that comprises the mold and the non-magnetic write gap layer on which the mold rests. This greatly facilitates formation of a high aspect ratio hole with a clean flat bottom and essentially vertical sides as well as the subsequent removal of the photoresist after said hole has been filled through electroplating to form a stitched sub-pole.

摘要翻译： 由于高级GMR磁头的磁盘系统的读取能力得到改善，所以有必要相应地减少记录数据的面积。 这需要在写入间隙处的缝合子极的变窄。 由于填充模具的问题，对于小于约0.4微米的极宽度来说，这已被证明是困难的。 在本发明中，通过在包括模具的平坦化正性光致抗蚀剂层和模具所在的非磁性写入间隙层之间引入一层PMGI（聚二甲基戊二酰亚胺）来克服这一点。 这大大有利于形成具有干净的平坦底部和基本上垂直的侧面的高纵横比孔，以及随后在通过电镀填充所述孔以形成缝合的子极之后去除光致抗蚀剂。