Method of manufacturing SRAM cell structure having a tunnel oxide
capacitor
    1.
    发明授权
    Method of manufacturing SRAM cell structure having a tunnel oxide capacitor 失效
    具有隧道氧化物电容器的SRAM单元结构的制造方法

    公开(公告)号:US5700707A

    公开(公告)日:1997-12-23

    申请号:US663579

    申请日:1996-06-13

    申请人: Hsiao-Lun Bob Lee

    发明人: Hsiao-Lun Bob Lee

    CPC分类号: H01L27/11 Y10S148/02

    摘要: An SRAM transistor cell on a doped semiconductor substrate comprises two access FET transistors and two storage FET transistors. A first load capacitor has a plate connected to a first node with the other plate connected to the power supply. A second load capacitor has a plate connected to the second node with the other plate connected to the power supply, a bit line and a bit line bar. The first storage transistor drain connects to the first node. The second storage transistor drain connects to the second node. The storage transistors have interconnected sources. The first node connects via a first interconnection line to the second transistor gate. The second node connects via a second interconnection line to the first transistor gate. First and second access transistor gates connect to a wordline. The first access transistor drain connects to the first node. The second access transistor drain connects to the second node. The first access transistor source connects to the bit line. The second access transistor source connects to the bit line bar.

    摘要翻译: 掺杂的半导体衬底上的SRAM晶体管单元包括两个存取FET晶体管和两个存储FET晶体管。 第一负载电容器具有连接至第一节点与连接到电源另一板的板。 第二负载电容器具有连接到所述第二节点与连接到电源,位线和位线条另一个板的板。 第一个存储晶体管漏极连接到第一个节点。 第二存储晶体管漏极连接到第二节点。 存储晶体管具有互连的源。 第一节点经由第一互连线连接到第二晶体管栅极。 第二节点通过第二互连线连接到第一晶体管栅极。 第一和第二存取晶体管栅极连接到字线。 第一存取晶体管漏极连接到第一节点。 第二存取晶体管漏极连接到第二节点。 第一个存取晶体管源连接到位线。 第二存取晶体管源连接到位线条。

    Sram cell structure
    2.
    发明授权
    Sram cell structure 失效
    Sram细胞结构

    公开(公告)号:US5825684A

    公开(公告)日:1998-10-20

    申请号:US929952

    申请日:1997-09-15

    申请人: Hsiao-Lun Bob Lee

    发明人: Hsiao-Lun Bob Lee

    CPC分类号: H01L27/11 Y10S148/02

    摘要: An SRAM transistor cell on a doped semiconductor substrate comprises two access FET transistors and two storage FET transistors. A first load capacitor has a plate connected to a first node with the other plate connected to the power supply. A second load capacitor has a plate connected to the second node with the other plate connected to the power supply, a bit line and a bit line bar. The first storage transistor drain connects to the first node. The second storage transistor drain connects to the second node. The storage transistors have interconnected sources. The first node connects via a first interconnection line to the second transistor gate. The second node connects via a second interconnection line to the first transistor gate. First and second access transistor gates connect to a wordline. The first access transistor drain connects to the first node. The second access transistor drain connects to the second node. The first access transistor source connects to the bit line. The second access transistor source connects to the bit line bar.

    摘要翻译: 掺杂半导体衬底上的SRAM晶体管单元包括两个存取FET晶体管和两个存储FET晶体管。 第一负载电容器具有连接到第一节点的板,另一个板连接到电源。 第二负载电容器具有连接到第二节点的板,另一个板连接到电源,位线和位线条。 第一个存储晶体管漏极连接到第一个节点。 第二存储晶体管漏极连接到第二节点。 存储晶体管具有互连的源。 第一节点经由第一互连线连接到第二晶体管栅极。 第二节点通过第二互连线连接到第一晶体管栅极。 第一和第二存取晶体管栅极连接到字线。 第一存取晶体管漏极连接到第一节点。 第二存取晶体管漏极连接到第二节点。 第一个存取晶体管源连接到位线。 第二存取晶体管源连接到位线条。