公开(公告)号：US3885877A

公开(公告)日：1975-05-27

申请号：US40534773

申请日：1973-10-11

Applicant: IBM

Inventor： HORWATH RONALD S ,  KOLB GEORGE A

IPC: H01L21/027 ,  G02B7/00 ,  G03F9/00 ,  H01L21/30 ,  H01L23/544 ,  G01B11/26

CPC classification number: G03F9/7076 ,  G03F9/00 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Consistent optical signals are produced for an electro-optical fine alignment system by the use of an overcoating. The overcoating is reflective at the alignment wave lengths so that the coating acts to present a new relief image to the alignment optics.

Abstract translation: 通过使用外涂层为电光学精细对准系统生产一致的光信号。 外涂层在对准波长处是反射的，使得涂层用于向对准光学器件呈现新的浮雕图像。

公开(公告)号：US3661436A

公开(公告)日：1972-05-09

申请号：US3661436D

申请日：1970-06-30

Applicant: IBM

Inventor： HORWATH RONALD S ,  SADAGOPAN VARADACHARI

IPC: G03F1/54 ,  G02B5/20

CPC classification number: G03F1/54 ,  Y10S438/943 ,  Y10S438/945

Abstract: A mask for the manufacture of semiconductor and other very small components. The mask is comprised of patterns of multi-component oxides and fluorides, such as spinels, perovskites, and garnets. In general, the materials are harder than the components being manufactured and are opaque to the wavelength used in photoresist techniques, while being transparent to the visible wavelengths. Materials with an energy gap between approximately 2.8 eV and 5 eV satisfy these optical properties, a particular example being GaFeO3. These masks are not damaged by surface defects on the components and can be visually aligned.

Abstract translation: 用于制造半导体和其他非常小的部件的掩模。 掩模由多组分氧化物和氟化物的图案组成，例如尖晶石，钙钛矿和石榴石。 通常，材料比制造的组件更硬，并且对于光致抗蚀剂技术中使用的波长是不透明的，同时对可见波长是透明的。 具有约2.8eV至5eV之间的能隙的材料满足这些光学性质，具体示例为GaFeO 3。 这些掩模不会被部件上的表面缺陷损坏，并且可以在视觉上对准。