-
公开(公告)号：US3573975A
公开(公告)日：1971-04-06
申请号：US3573975D
申请日：1968-07-10
Applicant: IBM
Inventor： DHAKA VIR A , CLARK EDWIN R , PINCK ARNOLD
CPC classification number: G03F7/2041
Abstract: IN A PHOTOCHEMICAL FABRICATION PROCESS WHEREIN A PHOTORESIST LAYER IS IMAGE-WISE EXPOSED BY CONTACT EXPOSURE THROUGH A MASK, THE IMPROVEMENT OF PROVIDING A LIQUID INTERFACE BETWEEN THE PHOTORESIST LAYER AND MASK PRIOR AND DURING EXPOSURE.
Search Results
1
records
(took 0.013 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
