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1.发明授权Method and apparatus for depositing films of refractory metal oxides and refractory metals 失效用于沉积难熔金属氧化物和难熔金属薄膜的方法和设备
公开(公告)号：US3208873A
公开(公告)日：1965-09-28
申请号：US16453362
申请日：1962-01-05
Applicant: IBM
Inventor： IRVING AMES , SIMMONS ROYCE G
CPC classification number: C23C14/14 , C23C14/0021 , C23C16/06
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