Monolithic III-V-on-silicon opto-electronic phase modulator with a ridge waveguide

    公开(公告)号:US11556043B2

    公开(公告)日:2023-01-17

    申请号:US17348049

    申请日:2021-06-15

    Applicant: IMEC VZW

    Abstract: A monolithic integrated electro-optical phase modulator, a Mach-Zehnder modulator including one or more of the phase modulators, and method for fabricating the phase modulator by III-V-on-silicon semiconductor processing are provided. The phase modulator includes a silicon-based n-type substrate base layer, and a III-V n-type ridge waveguide for propagating light, wherein the ridge waveguide protrudes from and extends along the n-type substrate base layer. Further, the phase modulator includes one or more insulating layers provided on the ridge waveguide, wherein the one or more insulating layers have together a thickness of 1-100 nm, and a silicon-based p-type top cover layer provided on the one or more insulating layers at least above the ridge waveguide.

    MONOLITHIC III-V-ON-SILICON OPTO-ELECTRONIC PHASE MODULATOR WITH A RIDGE WAVEGUIDE

    公开(公告)号:US20220011641A1

    公开(公告)日:2022-01-13

    申请号:US17348049

    申请日:2021-06-15

    Applicant: IMEC VZW

    Abstract: A monolithic integrated electro-optical phase modulator, a Mach-Zehnder modulator including one or more of the phase modulators, and method for fabricating the phase modulator by III-V-on-silicon semiconductor processing are provided. The phase modulator includes a silicon-based n-type substrate base layer, and a III-V n-type ridge waveguide for propagating light, wherein the ridge waveguide protrudes from and extends along the n-type substrate base layer. Further, the phase modulator includes one or more insulating layers provided on the ridge waveguide, wherein the one or more insulating layers have together a thickness of 1-100 nm, and a silicon-based p-type top cover layer provided on the one or more insulating layers at least above the ridge waveguide.

Patent Agency Ranking