公开(公告)号：US20240191168A1

公开(公告)日：2024-06-13

申请号：US18529820

申请日：2023-12-05

申请人： INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES

发明人： Junjie Li ,  Na Zhou ,  Enxu Liu ,  Jianfeng Gao ,  Junfeng Li ,  Jun Luo ,  Wenwu Wang

IPC分类号： C12M1/12 ,  G03F7/00

CPC分类号： C12M25/04 ,  G03F7/70383

摘要： A method for manufacturing a nanostructure and a nanostructure are disclosed. The method for manufacturing the nanostructure includes first alternately and periodically stacking a first material layer and a second material layer on a substrate to form a stacked layer, then forming a slot pattern on an upper surface of the stacked layer and etching the stacked layer to an upper surface of the substrate to transfer the slot pattern to the stacked layer, filling the slot pattern in the stacked layer with a molding material, and removing the first material layer or the second material layer left in the stacked layer, so as to form nanopores arranged in an array in the stacked layer.