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公开(公告)号:US20240219835A1
公开(公告)日:2024-07-04
申请号:US18530025
申请日:2023-12-05
申请人: Illumina, Inc.
发明人: Tanmay Ghonge , David Prescott , Daniel Wright , Yekaterina Rokhlenko , Alexandra Szemjonov , Francesca Patel-Burrows , Gavriela Moskowitz
CPC分类号: G03F7/11 , B01J19/0046 , B01L3/502707 , G03F7/038 , B01J2219/00722 , B01L2200/12
摘要: Examples of flow cells include substrates. Embodiments of the present disclosure also relate to methods of fabricating flow cell substrates. Some example workflows exploit light blocking properties of an imprint layer such that the process does not include etch steps. Such processes may be used to create substrates compatible with simultaneous paired-end sequencing methods.