PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PREPARING THE SAME, AND DRY FILM RESIST COMPRISING THE SAME
    1.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PREPARING THE SAME, AND DRY FILM RESIST COMPRISING THE SAME 失效
    光敏性树脂组合物,其制备方法和包含其的干膜保护层

    公开(公告)号:US20090136872A1

    公开(公告)日:2009-05-28

    申请号:US12328037

    申请日:2008-12-04

    IPC分类号: G03F7/004

    摘要: The present invention relates to a photosensitive resin composition, a preparation method thereof, and a dry film resist comprising the same. More particularly, the photosensitive resin composition of the present invention is directed to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at least two ethylenic double bonds, and c) a phosphinoxide based photopolymerization initiator and an acridon based photopolymerization initiator.According to the photosensitive resin composition and the dry film resist, it is easy to finely pattern using a laser direct image (LDI) with high density and the dry film has excellent sensitivity, resolution, and adhesiveness to the substrate.

    摘要翻译: 本发明涉及感光性树脂组合物及其制备方法以及含有该感光性树脂组合物的干膜抗蚀剂。 更具体地说,本发明的感光性树脂组合物涉及感光性树脂组合物,其包含a)碱溶性丙烯酸酯树脂,b)具有至少2个烯键式双键的交联单体,和c)基于氧化膦的光聚合 引发剂和吖啶基光聚合引发剂。 根据感光性树脂组合物和干膜抗蚀剂,可以容易地使用高密度的激光直接图像(LDI)进行精细图案化,并且干膜对基材具有优异的灵敏度,分辨率和粘附性。

    PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME
    2.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME 有权
    使用它的双层结构的可溶性树脂组合物控制溶解性和图案形成方法

    公开(公告)号:US20090191484A1

    公开(公告)日:2009-07-30

    申请号:US12351398

    申请日:2009-01-09

    IPC分类号: G03F7/20

    摘要: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.

    摘要翻译: 本发明涉及一种能够进行溶解度控制的新的感光性树脂组合物和使用该感光性树脂组合物的双层结构的图案形成方法,更具体地说,涉及可以控制 - 使用新的光聚合引发剂和较低 层状硬化剂,并且即使在低曝光能量下也可以根据曝光能量控制膜厚度而不发生图案破裂。 该感光性树脂组合物可用于LCD(液晶显示)制造工艺的滤色器和外涂层材料。