公开(公告)号：US20090186758A1

公开(公告)日：2009-07-23

申请号：US12010190

申请日：2008-01-22

Applicant: Pauline O. Ukpabi

Inventor： Pauline O. Ukpabi

IPC: B41M5/00

CPC classification number: B41M5/267 ,  Y10S430/106 ,  Y10S430/116 ,  Y10S430/146

Abstract: Record material imageable with a laser beam. The material is a substrate such as paper or polyolefin film having provided on at least one surface thereof a coating containing a solvent-soluble or disperse-type dye suitable for coloring plastics or polymers. Typical solvent-soluble and disperse-type dye include monoazo dyes, diazo dyes, anthraquinone dyes, coumarin dyes, quinoline dyes, xanthene dyes, and naphthalimide dyes. The record material does not show visible dye specks in the coating layer on the substrate because the dye has a very small average particle size—less than 50 microns. No more than 1% of the dye particles are larger than 100 microns. Also, method for imaging a substrate using heat energy by applying heat energy to the described record material to bring about a temperature in the coating greater than the melting temperature of the dye, causing color to become visible in the record material.

Abstract translation: 用激光束记录材料可成像。 该材料是在其至少一个表面上设置有包含适于着色塑料或聚合物的溶剂可溶性或分散型染料的涂层的基材例如纸或聚烯烃膜。 典型的溶剂可溶性和分散型染料包括单偶氮染料，重氮染料，蒽醌染料，香豆素染料，喹啉染料，呫吨染料和萘二甲酰亚胺染料。 记录材料在基底上的涂层中不显示可见的染料斑点，因为染料具有非常小的平均粒度 - 小于50微米。 不超过1％的染料颗粒大于100微米。 而且，通过将热能施加到所述记录材料以使涂层中的温度大于染料的熔融温度，导致颜色在记录材料中变得可见的用于使用热能成像基板的方法。

公开(公告)号：US07479362B2

公开(公告)日：2009-01-20

申请号：US11116265

申请日：2005-04-28

Applicant: Hitoshi Fukushima ,  Hiroshi Takiguchi ,  Tatsuya Shimoda ,  Takashi Masuda ,  Richard James Bushby ,  Stephan Evans ,  J.P. Jeyadevan ,  Kevin Critchley

Inventor： Hitoshi Fukushima ,  Hiroshi Takiguchi ,  Tatsuya Shimoda ,  Takashi Masuda ,  Richard James Bushby ,  Stephan Evans ,  J.P. Jeyadevan ,  Kevin Critchley

IPC: G03F7/00 ,  G03F7/004

CPC classification number: C07D207/404 ,  B82Y30/00 ,  G03F7/0045 ,  G03F7/165 ,  Y10S430/116 ,  Y10S430/136

Abstract: Aspects of the invention provide a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method can be attained by using a device for ejecting droplets and a molecule for inclusion in a SAM which can be photo-patterned in a short period of time using low energy UV radiation, that is TV radiation having a relatively long wavelength. The invention can provide monomolecular film that is formed from molecules comprising a structural component (B) which is hydrophobic and/or lipophobic, and a structural component (A) which decomposes when irradiated with UV light having a wavelength in the range 254-400 nm to cleave away a part of the molecule having the structural component (B) leaving a residual hydrophilic structural component (C). Further, the invention can provide a method of forming a film pattern comprising; at least a step of ejecting a droplet, which includes a compound represented as the following Formula (0), on a solid-phase surface having a functional moiety: X—Y-Z   (0) where, X represents a structure having reactivity to a functional moiety which exists at the solid-phase surface, Y represents a decomposable structure by itself and Z represents a structure which is capable of changing solid-state properties on the solid-phase surface or a reactive structure.

Abstract translation: 本发明的方面提供了一种控制固相表面的固态特性或控制成形反应区的方法。 该方法可以通过使用用于喷射液滴的装置和用于包含在SAM中的分子来实现，该SAM可以使用低能量UV辐射（即具有相对长的波长的电视辐射）在短时间内进行光刻图案化。 本发明可以提供由分子构成的单分子膜，该分子包含疏水性和/或疏水性的结构成分（B）和当波长为254-400nm的紫外线照射时分解的结构成分（A） 以除去具有结构组分（B）的分子的一部分，留下残留的亲水结构组分（C）。 此外，本发明可以提供一种形成膜图案的方法，包括： 在具有功能部分的固相表面上至少喷射包含下述式（0）表示的化合物的液滴的步骤：<？in-line-formula description =“In-line Formulas”end = “lead”？> XYZ（0）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中，X表示与固相存在的功能部分具有反应性的结构 表面，Y表示本身可分解的结构，Z表示能够改变固相表面或反应性结构的固态性质的结构。

公开(公告)号：US07381516B2

公开(公告)日：2008-06-03

申请号：US10263116

申请日：2002-10-02

Applicant: David S. Arney ,  Catherine A. Leatherdale ,  Manoj Nirmal

Inventor： David S. Arney ,  Catherine A. Leatherdale ,  Manoj Nirmal

IPC: G03F7/00 ,  G03F7/004

CPC classification number: C08F2/50 ,  B33Y70/00 ,  B82Y10/00 ,  B82Y30/00 ,  G03F7/029 ,  G03F7/2053 ,  Y10S430/114 ,  Y10S430/115 ,  Y10S430/116 ,  Y10S430/117

Abstract: A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising photochemically-effective amounts of (1) at least one type of semiconductor nanoparticle quantum dot that has at least one electronic excited state that is accessible by absorption of two or more photons, and (2) a composition, different from said reactive species, that is capable of interacting with the excited state of the semiconductor nanoparticle quantum dot to form at least one reaction-initiating species.

Abstract translation: 光反应性组合物包含（a）能够经历酸或自由基引发的化学反应的至少一种反应性物质; 和（b）包含光化学有效量的（1）至少一种类型的半导体纳米粒子量子点的光引发剂体系，其具有至少一个可通过吸收两个或更多个光子获得的电子激发态，和（2）组成 与所述反应性物质不同，其能够与半导体纳米颗粒量子点的激发态相互作用以形成至少一种反应引发物质。

公开(公告)号：US20060257783A1

公开(公告)日：2006-11-16

申请号：US11416309

申请日：2006-05-03

Applicant: Atsushi Sugasaki

Inventor： Atsushi Sugasaki

IPC: G03C1/00

CPC classification number: G03F7/0325 ,  C08F220/34 ,  C08F220/38 ,  C08F220/58 ,  C08F220/60 ,  C08F251/00 ,  C08L5/00 ,  C08L51/02 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  Y10S430/106 ,  Y10S430/112 ,  Y10S430/116 ,  C08L2666/28 ,  C08L2666/02

Abstract: A lithographic printing plate precursor having a photosensitive layer containing (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator, or a lithographic printing plate precursor having an undercoat layer comprising (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, and a photosensitive layer containing (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator.

公开(公告)号：US07118845B2

公开(公告)日：2006-10-10

申请号：US10455675

申请日：2003-06-05

Applicant: Robert J. DeVoe ,  Harvey W. Kalweit ,  Catherine A. Leatherdale ,  Todd R. Williams

Inventor： Robert J. DeVoe ,  Harvey W. Kalweit ,  Catherine A. Leatherdale ,  Todd R. Williams

IPC: C08F2/50

CPC classification number: C08F2/50 ,  G03F7/0047 ,  G03F7/029 ,  G03F7/0295 ,  G03F7/031 ,  G03F7/038 ,  G03F7/2053 ,  Y10S430/114 ,  Y10S430/115 ,  Y10S430/116 ,  Y10S430/117

Abstract: A process for fabricating of an article by exposing a photoreactive composition to light under multiphoton absorption conditions. The light passes through an optical system having a final optical element having a numeric aperture in a range of from 0.65 to 1.25, inclusive.

Abstract translation: 一种通过将光反应性组合物在多光子吸收条件下曝光来制造制品的方法。 光通过具有最小光学元件的光学系统，该光学元件的数值孔径在0.65至1.25的范围内，包括端值。

公开(公告)号：US06709804B2

公开(公告)日：2004-03-23

申请号：US10368960

申请日：2003-02-19

Applicant: Yusuke Tajima ,  Kazuo Takeuchi ,  Yasuo Shigemitsu ,  Etsu Takeuchi

Inventor： Yusuke Tajima ,  Kazuo Takeuchi ,  Yasuo Shigemitsu ,  Etsu Takeuchi

IPC: G03C173

CPC classification number: B82Y15/00 ,  B82Y30/00 ,  G03F7/0387 ,  H05K1/023 ,  H05K3/4676 ,  Y10S430/116 ,  Y10S430/121

Abstract: A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprises coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition forms a resin layer having excellent heat resistance.

Abstract translation: 印刷电路板，用于配置半导体芯片的基板和通过用包含氧敏感剂和顺式二烯取代的聚酰胺酸或聚酰亚胺的感光性树脂组合物涂布基板而制备的半导体装置，并通过暴露于辐射形成精细图案。 用于制造印刷线路板的方法，用于设置半导体芯片的基板和半导体器件，其包括用感光性树脂组合物涂布基材并通过与通过氧气曝光产生的单线态氧化缩聚反应顺式二烯来形成精细图案 敏化剂对辐射。 感光性树脂组合物为负型，显示出高灵敏度，高分辨率。 感光性树脂组合物形成耐热性优异的树脂层。

公开(公告)号：US20030215744A1

公开(公告)日：2003-11-20

申请号：US10425158

申请日：2003-04-29

Applicant: AGFA-GEVAERT

Inventor： Willi-Kurt Gries

IPC: G03F007/028 ,  G03F007/09 ,  G03F007/20

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/12 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/264 ,  B41C2210/266 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/116 ,  Y10S430/146

Abstract: The present invention relates to a radiation-sensitive mixture which contains an acrylate or methacrylate monomer and/or oligomer capable of free radical polymerization and having at least two acrylate and/or methacrylate groups and at least one photooxidizable group, a photoinitiator, an organic polymeric binder and a heptamethinecyanine dye acting as an IR-absorbing dye. It furthermore relates to a recording material comprising a substrate and a photopolymerizable layer and a process for the production of a printing plate from this recording material. The recording material is distinguished by suitable photosensitivity.

Abstract translation: 本发明涉及一种辐射敏感性混合物，其包含能够自由基聚合并具有至少两个丙烯酸酯和/或甲基丙烯酸酯基团和至少一个可光氧化基团的丙烯酸酯或甲基丙烯酸酯单体和/或低聚物，光引发剂，有机聚合物 粘合剂和作为IR吸收染料的七甲基氰染料。 此外，本发明还涉及包含基材和可光聚合层的记录材料以及从该记录材料制备印刷版的方法。 记录材料的特征在于适合的光敏性。

公开(公告)号：US20030194621A1

公开(公告)日：2003-10-16

申请号：US10368960

申请日：2003-02-19

Applicant: RIKEN

Inventor： Yusuke Tajima ,  Kazuo Takeuchi ,  Yasuo Shigemitsu ,  Etsu Takeuchi

IPC: G03F007/038

CPC classification number: B82Y15/00 ,  B82Y30/00 ,  G03F7/0387 ,  H05K1/023 ,  H05K3/4676 ,  Y10S430/116 ,  Y10S430/121

Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a polyamic acid or a polyimide which has substituents having a cis-diene structure at the side chains; a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating the substrate with the composition and forming fine patterns by exposure of irradiation; and processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device which comprise coating the substrate with the composition and forming fine patterns by crosslinking the cis-diene group by polycondensation with oxidation with the singlet oxygen generated by exposure of irradiation to the oxygen sensitizer in the presence of oxygen. The photosensitive resin composition of the negative type exhibits high sensitivity and high resolution, can form a resin layer having excellent heat resistance and can be applied to production of semiconductor devices and circuit wiring boards. The printed wiring board, the substrate for disposing semiconductor chips and the semiconductor device can be obtained by using the composition. The processes provide the printed wiring board, the substrate for disposing semiconductor chips and the semiconductor device.

Abstract translation: 一种感光性树脂组合物，其包含氧敏感剂和聚酰胺酸或聚酰亚胺，该侧链具有顺式 - 二烯结构的取代基; 印刷布线板，用于设置半导体芯片的基板和通过用该组合物涂覆基板而制备的半导体器件，并通过照射曝光形成精细图案; 以及用于制造印刷线路板的方法，用于设置半导体芯片的基板和半导体器件，其包括用该组合物涂覆基板并通过与通过曝光产生的单线态氧氧化与顺式二烯基团进行交联而形成精细图案 在氧的存在下照射到氧敏感剂。 负型的感光性树脂组合物显示出高灵敏度和高分辨率，可以形成耐热性优异的树脂层，并且可以应用于半导体器件和电路布线板的制造。 可以通过使用该组合物来获得印刷线路板，用于设置半导体芯片的基板和半导体器件。 这些工艺提供印刷线路板，用于设置半导体芯片的基板和半导体器件。

公开(公告)号：US06528231B1

公开(公告)日：2003-03-04

申请号：US09490627

申请日：2000-01-24

Applicant: Yusuke Tajima ,  Kazuo Takeuchi ,  Yasuo Shigemitsu ,  Etsu Takeuchi

Inventor： Yusuke Tajima ,  Kazuo Takeuchi ,  Yasuo Shigemitsu ,  Etsu Takeuchi

IPC: G03C173

CPC classification number: B82Y15/00 ,  B82Y30/00 ,  G03F7/0387 ,  H05K1/023 ,  H05K3/4676 ,  Y10S430/116 ,  Y10S430/121

Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or a polyimide. A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with the photosensitive resin composition and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprise coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition can form a resin layer having excellent heat resistance.

Abstract translation: 包含氧敏感剂和顺式二烯取代的聚酰胺酸或聚酰亚胺的感光性树脂组合物。 印刷电路板，用于设置半导体芯片的基板和通过用感光性树脂组合物涂布基板而制备的半导体器件，并且通过暴露于辐射形成精细图案。 制造印刷电路板的方法，用于设置半导体芯片的基板和半导体装置，其包括用感光性树脂组合物涂布基板并通过与通过氧气曝光产生的单线态的氧化缩聚来交联顺式二烯而形成精细图案 敏化剂对辐射。 感光性树脂组合物为负型，显示出高灵敏度，高分辨率。 感光性树脂组合物可以形成耐热性优异的树脂层。

公开(公告)号：US20030003399A1

公开(公告)日：2003-01-02

申请号：US09832989

申请日：2001-04-11

Inventor： Ursula Muller ,  Tobias Wittig ,  Hans-Joachim Timpe

IPC: G03F007/031 ,  G03F007/029 ,  G03F007/038 ,  G03F007/11 ,  G03F007/38 ,  G03F007/30

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/465 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/118 ,  Y10S430/119 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/126 ,  Y10S430/127 ,  Y10S430/145 ,  Y10S430/146

Abstract: The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazolium dyes, cyanine dyes, polyaniline dyes, polypyrrole dyes, polythiophene dyes and phthalocyanine pigments (b) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds (c) at least one polycarboxylic acid represented by the following formula I 1 wherein Y is selected from the group consisting of O, S and NR7, each of R4, R5 and R6 is independently selected from the group consisting of hydrogen, C1-C4 alkyl, aryl which is optionally substituted, nullCOOH and NR8CH2COOH, R7 is selected from the group consisting of hydrogen, C1-C6 alkyl, nullCH2CH2OH, and C1-C5 alkyl substituted with -COOH, R8 is selected from the group consisting of nullCH2COOH, nullCH2OH and null(CH2)2N(CH2COOH)2 and r is 0, 1, 2 or 3 with the proviso that at least one of R4, R5, R6, R7 and R8 comprises a nullCOOH group or salts thereof, and (d) at least one leuco dye, wherein the following inequation is met: oxa

Abstract translation: 本发明涉及含有引发剂体系的IR敏感组合物，其包含：（a）至少一种能够吸收选自三芳基胺染料，噻唑鎓染料，吲哚鎓染料，恶唑鎓染料，花青染料，聚苯胺染料，聚吡咯染料， 聚噻吩染料和酞菁颜料（b）至少一种能够产生选自多卤烷基取代的化合物的基团的化合物（c）至少一种由下式I表示的多元羧酸，其中Y选自O，S和NR7 ，R 4，R 5和R 6各自独立地选自氢，C 1 -C 4烷基，任选被取代的芳基，-COOH和NR 8 CH 2 COOH，R 7选自氢，C 1 -C 6烷基， CH 2 CH 2 OH和被-COOH取代的C 1 -C 5烷基，R 8选自-CH 2 COOH，-CH 2 OH和 - （CH 2）2 N（CH 2 COOH）2，r是0,1,2或3，条件是在 最小 R 4，R 5，R 6，R 7和R 8中的一个包含-COOH基团或其盐，和（d）至少一种无色染料，其中符合以下不等式：<段落lvl =“0” （e）中oxa =组分（a）的氧化电位的公式> oxa e e redb = eV中组分（b）的还原电位这些组合物特别适用于制备 印版。