公开(公告)号：US20140345910A1

公开(公告)日：2014-11-27

申请号：US14267229

申请日：2014-05-01

Applicant: InnoLux Corporation

Inventor： Ya-Leng WANG ,  Hung-Sheng CHO ,  Tung-Chang TSAI

IPC: H05K1/09 ,  H05K3/12

CPC classification number: G06F3/044 ,  G06F2203/04103 ,  H05K3/106 ,  H05K3/12 ,  H05K3/4685 ,  H05K2201/0326 ,  H05K2203/1157

Abstract: The present invention relates to a method for forming a conductive line, and a device comprising the conductive line. The method for forming a conductive line comprises: (A) providing a metal oxide composition which comprises a metal oxide, and a reducing agent; (B) applying the metal oxide composition on a substrate, and curing the metal oxide composition to form an metal oxide layer; and (C) irradiating the metal oxide layer by a light source to occur a chemical reduction reaction between the metal oxide and the reducing agent in the metal oxide layer to proceed to thereby form a conductive line.

Abstract translation: 本发明涉及一种用于形成导线的方法，以及包括该导线的装置。 形成导电线的方法包括：（A）提供包含金属氧化物和还原剂的金属氧化物组合物; （B）将金属氧化物组合物涂布在基板上，使金属氧化物组合物固化形成金属氧化物层; 和（C）通过光源照射金属氧化物层，在金属氧化物层中的金属氧化物和还原剂之间发生化学还原反应，进行形成导电线。