公开(公告)号：US20240199658A1

公开(公告)日：2024-06-20

申请号：US18525244

申请日：2023-11-30

Applicant: Inpria Corporation

Inventor： Robert E. Jilek ,  Christopher J. Reed ,  Bryan Novas

IPC: C07F7/22 ,  B01J31/02 ,  B01J35/39

CPC classification number: C07F7/2224 ,  B01J31/0279 ,  B01J35/39 ,  C07F7/2296 ,  B01J2231/44

Abstract: Synthesis techniques are described for forming organotin trialkoxide compounds via direct alkylation of tin alkoxides. A first method involves reacting an alkali metal tin trialkoxide with an organohalide compound (RXn, where X is a halide atom and n≥1) to form a monoorgano tin trialkoxide represented by the formula R[Sn(OR′)3]n. The method can be used to form polytin trialkoxide compounds with a plurality of radiation sensitive C—Sn bonds. R and R′ include organo groups and can optionally comprise hetero-atoms and/or unsaturated bonds. A second method involves the ultraviolet light-driven reaction of a di-tin tetraalkoxide with an organohalide compound (RX) to form a monoorgano trialkoxide represented by the formula RSn(OR′)3. A third method involves the visible or ultraviolet light-driven reaction of a di-tin tetraalkoxide or an alkali metal tin trialkoxide with an fluorinated organohalide compound (RFX) to form a fluorinated monoorgano trialkoxide represented by the formula RFSn(OR′)3. The disclosed methods provide for high mono-organo specificity. Corresponding organotin trialkoxide compositions are also described. The compositions are useful for radiation patterning, especially with EUV radiation. The organotin trialkoxide compositions may be formed as radiation-patternable coatings on substrates.