公开(公告)号：US20240427239A1

公开(公告)日：2024-12-26

申请号：US18731702

申请日：2024-06-03

Applicant: Inpria Corporation

Inventor： Robert E. Jilek ,  Christopher J. Reed

IPC: G03F7/027 ,  C08F30/04 ,  G03F7/004

Abstract: Organotin compositions suitable for radiation based patterning have ligands providing fluorinated groups and unsaturated carbon-carbon bonds, such as C═C bonds. The fluorinated groups and unsaturated carbon-carbon bonds may or may not be located on the same ligand. Blends of precursors with different ligands provide added flexibility with respect to precursor design. Fluorinated organometallic compounds can be represented by the formula RUFSn(OR′)3, wherein RUF is an organo group with 1 to 31 carbon atoms with at least one C═C bond and at least one fluorine atom bonded to a carbon, with the organo group forming a C—Sn bond, wherein R′ is an organo group with 1 to 10 carbon atoms. Precursors are suitable for solution based deposition or vapor based deposition.

公开(公告)号：US20240199658A1

公开(公告)日：2024-06-20

申请号：US18525244

申请日：2023-11-30

Applicant: Inpria Corporation

Inventor： Robert E. Jilek ,  Christopher J. Reed ,  Bryan Novas

IPC: C07F7/22 ,  B01J31/02 ,  B01J35/39

CPC classification number: C07F7/2224 ,  B01J31/0279 ,  B01J35/39 ,  C07F7/2296 ,  B01J2231/44

Abstract: Synthesis techniques are described for forming organotin trialkoxide compounds via direct alkylation of tin alkoxides. A first method involves reacting an alkali metal tin trialkoxide with an organohalide compound (RXn, where X is a halide atom and n≥1) to form a monoorgano tin trialkoxide represented by the formula R[Sn(OR′)3]n. The method can be used to form polytin trialkoxide compounds with a plurality of radiation sensitive C—Sn bonds. R and R′ include organo groups and can optionally comprise hetero-atoms and/or unsaturated bonds. A second method involves the ultraviolet light-driven reaction of a di-tin tetraalkoxide with an organohalide compound (RX) to form a monoorgano trialkoxide represented by the formula RSn(OR′)3. A third method involves the visible or ultraviolet light-driven reaction of a di-tin tetraalkoxide or an alkali metal tin trialkoxide with an fluorinated organohalide compound (RFX) to form a fluorinated monoorgano trialkoxide represented by the formula RFSn(OR′)3. The disclosed methods provide for high mono-organo specificity. Corresponding organotin trialkoxide compositions are also described. The compositions are useful for radiation patterning, especially with EUV radiation. The organotin trialkoxide compositions may be formed as radiation-patternable coatings on substrates.

公开(公告)号：US20250074930A1

公开(公告)日：2025-03-06

申请号：US18816097

申请日：2024-08-27

Applicant: Inpria Corporation

Inventor： Alexander C. Marwitz ,  Kai Jiang ,  Bryan T. Novas ,  Robert E. Jilek ,  Christopher J. Reed ,  Brian J. Cardineau ,  Munendra Yadav

IPC: C07F7/22 ,  C09K11/06 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32

Abstract: Organotin patterning compositions have radiation sensitive ligands with acetal functional groups. Precursor compositions are compositions comprising (OR4)(OR3)R2CR1SnL3, where the R groups are substituted or unsubstituted hydrocarbyl groups and L is a hydrolysable ligand. The precursors can be formed into coating that can be patterned with radiation, in particular EUV radiation. Coatings formed with blended precursors with hydrocarbyl-based ligands with some having acetal groups and others lacking acetal groups can be particularly effective for improving positive tone patterning.