公开(公告)号：US11486978B2

公开(公告)日：2022-11-01

申请号：US16232213

申请日：2018-12-26

Applicant: Intel Corporation

Inventor： Alexander Marshall Merritt ,  David I. Gonzalez Aguirre ,  Kathiravetpillai Sivanesan ,  Ignacio Alvarez ,  Sridhar Sharma

IPC: G01S7/4863 ,  G01S7/48 ,  G01S7/484 ,  G01S7/02 ,  G01S17/10 ,  G01S7/00 ,  G01S17/04 ,  G01S17/931

Abstract: Systems, apparatuses and methods may provide for technology that initiates one or more optical pulses in accordance with a first emission pattern, obtains a second emission pattern in response to one or more of a time-variable trigger or a deviation of one or more received optical reflections from an expected reflection pattern, and initiates one or more optical pulses in accordance with the second emission pattern. Moreover, infrastructure node technology may detect, based on an interference notification from a first sensor platform, a deviation of received optical reflection(s) from an expected reflection pattern, select emission parameter(s) in response to the deviation, and alter a first emission pattern with respect to the selected emission parameter(s) to obtain a second emission pattern.

公开(公告)号：US20190129014A1

公开(公告)日：2019-05-02

申请号：US16232213

申请日：2018-12-26

Applicant: Intel Corporation

Inventor： Alexander Marshall Merritt ,  David I. Gonzalez Aguirre ,  Kathiravetpillai Sivanesan ,  Ignacio Alvarez ,  Sridhar Sharma

IPC: G01S7/486 ,  G01S7/48 ,  G01S7/484 ,  G01S17/02 ,  G01S17/93

Abstract: Systems, apparatuses and methods may provide for technology that initiates one or more optical pulses in accordance with a first emission pattern, obtains a second emission pattern in response to one or more of a time-variable trigger or a deviation of one or more received optical reflections from an expected reflection pattern, and initiates one or more optical pulses in accordance with the second emission pattern. Moreover, infrastructure node technology may detect, based on an interference notification from a first sensor platform, a deviation of received optical reflection(s) from an expected reflection pattern, select emission parameter(s) in response to the deviation, and alter a first emission pattern with respect to the selected emission parameter(s) to obtain a second emission pattern.