公开(公告)号：US20230130944A1

公开(公告)日：2023-04-27

申请号：US18089213

申请日：2022-12-27

Applicant: Intel Corporation

Inventor： Robert STARKSTON ,  Debendra MALLIK ,  John S. GUZEK ,  Chia-Pin CHIU ,  Deepak KULKARNI ,  Ravi V. MAHAJAN

IPC: H01L23/522 ,  H01L23/538 ,  H01L23/00 ,  H01L25/065 ,  H01L25/00

Abstract: Embodiments of a system and methods for localized high density substrate routing are generally described herein. In one or more embodiments an apparatus includes a medium, first and second circuitry elements, an interconnect element, and a dielectric layer. The medium can include low density routing therein. The interconnect element can be embedded in the medium, and can include a plurality of electrically conductive members therein, the electrically conductive member can be electrically coupled to the first circuitry element and the second circuitry element. The interconnect element can include high density routing therein. The dielectric layer can be over the interconnect die, the dielectric layer including the first and second circuitry elements passing therethrough.

公开(公告)号：US20240421073A1

公开(公告)日：2024-12-19

申请号：US18818285

申请日：2024-08-28

Applicant: Intel Corporation

Inventor： Robert STARKSTON ,  Debendra MALLIK ,  John S. GUZEK ,  Chia-Pin CHIU ,  Deepak KULKARNI ,  Ravi V. MAHAJAN

IPC: H01L23/522 ,  H01L21/56 ,  H01L23/00 ,  H01L23/538 ,  H01L25/00 ,  H01L25/065 ,  H01L25/18

Abstract: Embodiments of a system and methods for localized high density substrate routing are generally described herein. In one or more embodiments an apparatus includes a medium, first and second circuitry elements, an interconnect element, and a dielectric layer. The medium can include low density routing therein. The interconnect element can be embedded in the medium, and can include a plurality of electrically conductive members therein, the electrically conductive member can be electrically coupled to the first circuitry element and the second circuitry element. The interconnect element can include high density routing therein. The dielectric layer can be over the interconnect die, the dielectric layer including the first and second circuitry elements passing therethrough.

公开(公告)号：US20230040850A1

公开(公告)日：2023-02-09

申请号：US17972340

申请日：2022-10-24

Applicant: Intel Corporation

Inventor： Robert STARKSTON ,  Debendra MALLIK ,  John S. GUZEK ,  Chia-Pin CHIU ,  Deepak KULKARNI ,  Ravi V. MAHAJAN

IPC: H01L23/522 ,  H01L25/00 ,  H01L23/00 ,  H01L25/065 ,  H01L23/538

Abstract: Embodiments of a system and methods for localized high density substrate routing are generally described herein. In one or more embodiments an apparatus includes a medium, first and second circuitry elements, an interconnect element, and a dielectric layer. The medium can include low density routing therein. The interconnect element can be embedded in the medium, and can include a plurality of electrically conductive members therein, the electrically conductive member can be electrically coupled to the first circuitry element and the second circuitry element. The interconnect element can include high density routing therein. The dielectric layer can be over the interconnect die, the dielectric layer including the first and second circuitry elements passing therethrough.