公开(公告)号：US20030013247A1

公开(公告)日：2003-01-16

申请号：US10234089

申请日：2002-09-04

申请人： International Business Machines Corporation

发明人： Osamu Tokuhiro ,  Hiroyuki Ueda ,  Masahiko Machida

IPC分类号： H01L021/8238

CPC分类号： H01L29/66765 ,  G02F1/1368 ,  G02F2001/136231 ,  H01L29/4908 ,  H01L29/78609 ,  H01L29/78633

摘要： A method of manufacturing a liquid crystal panel comprises the steps of forming a gate insulating film, a channel layer and an etching stopper layer on a transparent substrate bearing a gate electrode, exposing the substrate to light from its back surface side by using the gate electrode as a light shielding mask by photolithography, developing the resist, etching the etching stopper layer, forming a source/drain layer, and etching the source/drain layer and a remaining part of the etching stopper by chemical gas phase etching.