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公开(公告)号:US10105119B2
公开(公告)日:2018-10-23
申请号:US15567879
申请日:2016-04-22
Applicant: Ion Beam Applications S.A.
Inventor: Simon Marcelis , Yves Claereboudt , Thierry Mertens , Frédéric Dessy
Abstract: A phantom and method for quality assurance of a particle therapy apparatus used in the intensity modulated particle therapy (IMPT) mode is provided. The phantom comprises a frame structure having a first face and a second face that is parallel to the first face. The phantom further comprises one or more wedges, and a first and second block of material each having a first block face and a second block face parallel thereto. In addition, the phantom further includes an absolute dosimeter arranged at the first block face. A plurality of beads of high density material is located in the first or second block, and a 2D detector is arranged at the second face of the frame structure.
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公开(公告)号:US11045666B2
公开(公告)日:2021-06-29
申请号:US16654049
申请日:2019-10-16
Applicant: Ion Beam Applications S.A.
Inventor: Vincent Bossier , Yves Claereboudt , Guillaume Janssens , Olivier De Wilde , David Vangeenberghe
IPC: A61N5/10
Abstract: A particle therapy system includes a particle accelerator for generating a charged particle beam, a beam delivery device, a beam transport system for transporting the beam from the particle accelerator to the beam delivery device, and a supporting device for supporting a subject. The beam delivery device is rotatable around the target and with respect to the supporting device, so as to be able to deliver the beam to the target according to a plurality of irradiation angles. The system also includes a controller configured to make the beam delivery device rotate at a beam-on speed and meanwhile to irradiate the target with the beam. The controller is configured to make the beam delivery device rotate at at least two different beam-on speeds with respect to the supporting device, a first speed corresponding to a first irradiation angle and a second speed corresponding to a second irradiation angle.
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公开(公告)号:US10070510B2
公开(公告)日:2018-09-04
申请号:US15725350
申请日:2017-10-05
Applicant: Ion Beam Applications S.A.
Inventor: Gabriel Krier , Sèbastien Henrotin , Yves Claereboudt
Abstract: The embodiments of the present disclosure relate to a method and system for controlling the extraction of ion beam pulses produced by a synchrocyclotron. The synchrocyclotron comprises electrodes configured to be placed in a magnetic field. An alternating voltage is applied between the electrodes, and the frequency of the alternating voltage is modulated in a cyclic manner. In other embodiments, the method further comprises the steps of starting an acceleration cycle of the synchrocyclotron, generating a reference signal when the modulated frequency reaches a predefined value, communicating the time, at which the reference signal is generated, to the beam control elements, assessing one or more status parameters of the one or more beam control elements, and cancelling or proceeding with the extraction of the beam pulse depending on the results of the assessment.
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公开(公告)号:US09192787B2
公开(公告)日:2015-11-24
申请号:US14397062
申请日:2013-04-24
Applicant: Ion Beam Applications S.A.
Inventor: Frédéric Dessy , Yves Claereboudt
CPC classification number: A61N5/1049 , A61N5/1071 , A61N5/1075 , A61N5/1078 , A61N2005/1061 , A61N2005/1076 , A61N2005/1087
Abstract: The present invention is related to an apparatus and method for hadron beam verification. The apparatus allows to verify a number of different characteristics in a brief time span. The apparatus comprises at least one main degrader element and associated therewith a multiple thickness degrader element. The latter may comprise a number of patches of beam degrading material, the patches having constant but mutually different thicknesses. Alternatively, it may be a wedge-shaped element. By aiming a pencil beam at the various thicknesses, data points can be obtained which allow to make an estimation of the beam range. In addition to this, the apparatus comprises a zone where no degrader material is present, and where a measurement of the spot size can be obtained, without moving or replacing the apparatus.
Abstract translation: 本发明涉及一种用于强子束验证的装置和方法。 该装置允许在短时间内验证许多不同的特征。 该装置包括至少一个主降解元件并与其相关联的多层厚度降解元件。 后者可以包括许多光束退化材料的斑块,所述贴片具有恒定但相互不同的厚度。 或者,它可以是楔形元件。 通过瞄准各种厚度的铅笔光束,可以获得允许估计光束范围的数据点。 除此之外,该装置包括没有降解材料存在的区域,并且可以在不移动或更换设备的情况下获得斑点尺寸的测量。
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公开(公告)号:US20150141732A1
公开(公告)日:2015-05-21
申请号:US14397062
申请日:2013-04-24
Applicant: Ion Beam Applications S.A.
Inventor: Frédéric Dessy , Yves Claereboudt
IPC: A61N5/10
CPC classification number: A61N5/1049 , A61N5/1071 , A61N5/1075 , A61N5/1078 , A61N2005/1061 , A61N2005/1076 , A61N2005/1087
Abstract: The present invention is related to an apparatus and method for hadron beam verification. The apparatus allows to verify a number of different characteristics in a brief time span. The apparatus comprises at least one main degrader element and associated therewith a multiple thickness degrader element. The latter may comprise a number of patches of beam degrading material, the patches having constant but mutually different thicknesses. Alternatively, it may be a wedge-shaped element. By aiming a pencil beam at the various thicknesses, data points can be obtained which allow to make an estimation of the beam range. In addition to this, the apparatus comprises a zone where no degrader material is present, and where a measurement of the spot size can be obtained, without moving or replacing the apparatus.
Abstract translation: 本发明涉及一种用于强子束验证的装置和方法。 该装置允许在短时间内验证许多不同的特征。 该装置包括至少一个主降解元件并与其相关联的多层厚度降解元件。 后者可以包括许多光束退化材料的斑块,所述贴片具有恒定但相互不同的厚度。 或者,它可以是楔形元件。 通过瞄准各种厚度的铅笔光束,可以获得允许估计光束范围的数据点。 除此之外,该装置包括没有降解材料存在的区域,并且可以在不移动或更换设备的情况下获得斑点尺寸的测量。
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