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公开(公告)号：US20230192609A1
公开(公告)日：2023-06-22
申请号：US18068728
申请日：2022-12-20
发明人： Sung Won SHIM , Byung Ki SON , Hwan CHOI , Youn Soo SHIN , Hwa Yeong CHOI , Tae Gi CHOI , Yeong Su CHOO
IPC分类号： C07D207/267 , C07D307/83 , C07D307/60
CPC分类号： C07D207/267 , C07D307/83 , C07D307/60
摘要： Provided is a method for purifying waste N-methyl-2-pyrrolidone, the method comprising the steps of: reacting the waste N-methyl-2-pyrrolidone containing an amine compound with an acid anhydride; converting the amine compound into an amide compound; and removing the amide compound by distillation, thereby manufacturing high-purity N-methyl-2-pyrrolidone that can be reused.
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公开(公告)号：US20230095681A1
公开(公告)日：2023-03-30
申请号：US17934099
申请日：2022-09-21
发明人： Sung Won SHIM , Byung Ki SON , Hwan CHOI , Youn Soo SHIN , Hwa Yeong CHOI , Ho JEONG
摘要： Provided is a method for purifying an alkylene glycol monoalkyl ether carboxylic acid ester (AGAECE) for photoresist processing, wherein the method comprises the step of distillation after passing industrial AGAECE through a porous adsorbent impregnated with a basic material, and it is possible to obtain a semiconductor-grade high-purity AGAECE maintaining a low acid value and high purity according to the present invention.
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