公开(公告)号：US11694875B2

公开(公告)日：2023-07-04

申请号：US17400580

申请日：2021-08-12

Applicant: JEOL Ltd.

Inventor： Masakazu Iwanaga

IPC: H01J37/302 ,  G06F3/0482 ,  G06F3/04847

CPC classification number: H01J37/3026 ,  G06F3/0482 ,  G06F3/04847 ,  H01J2237/30411 ,  H01J2237/30483 ,  H01J2237/31761

Abstract: A charged particle beam drawing device includes: a storage unit that stores a pattern generation program for generating pattern data, the pattern generation program being a program in which an instruction for specifying a type of a figure and an instruction for specifying a regular arrangement of the figure are described; an execution unit that executes the pattern generation program stored in the storage unit; and a control unit that performs drawing control based on the pattern data generated by the executed pattern generation program.