Abstract:
A display panel including: a substrate; a multi-layer wiring layer disposed over the substrate and including a first power line and a second power line; organic electroluminescence elements over the multi-layer wiring layer; a partition wall over the multi-layer wiring layer; and a member over the multi-layer wiring layer, a height of the member from the substrate being greater than a height of the partition wall from the substrate, wherein the multi-layer wiring layer includes a first portion and a second portion, the organic electroluminescence elements are arrayed on the first portion, in the second portion, the first power line and the second power line intersect, and the member is positioned on the second portion without overlapping at least one of the first power line and the second power line in plan view of the substrate.
Abstract:
An examination is performed of whether or not a bank having a defect portion is present. When a bank having a defect portion is present, the bank having the defect portion is repaired by forming a dam in each of adjacent concave spaces between which the bank having the defect portion is located. A dam formed in a concave space partitioning the concave space into a first space in a vicinity of the defect portion and a second space outside the vicinity of the defect portion.
Abstract:
Each of blue light emitting elements includes: a photoanode; a translucent cathode; an organic light emitting layer between the photoanode and the translucent cathode; a first functional layer between the organic light emitting layer and the photoanode; and a second functional layer between the organic light emitting layer and the translucent cathode, and has a resonator structure. The first functional layer has an optical film thickness of 48-62 nm. The translucent cathode is a stack of a first translucent conductive layer, a metal layer, and a second translucent conductive layer stacked in this order from the second functional layer side. The first translucent conductive layer has a refractivity of 2.0-2.4, and a film thickness of 85-97 nm. The metal layer has a refractivity different by 0 to 2.0 from that of the first translucent conductive layer, and has a film thickness of 2-22 nm.