公开(公告)号：US11243468B2

公开(公告)日：2022-02-08

申请号：US16564499

申请日：2019-09-09

Applicant: JSR CORPORATION

Inventor： Naoya Nosaka ,  Goji Wakamatsu ,  Tsubasa Abe ,  Ichihiro Miura ,  Kengo Ehara ,  Hiroki Nakatsu ,  Hiroki Nakagawa

IPC: G03F7/20 ,  G03F7/038 ,  G03F7/09 ,  C08G61/12 ,  G03F7/039 ,  C08G61/04

Abstract: A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R1 and R2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R1 and R2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R1 and R2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R1 and R2 bond.

公开(公告)号：US20200012193A1

公开(公告)日：2020-01-09

申请号：US16564499

申请日：2019-09-09

Applicant: JSR CORPORATION

Inventor： Naoya NOSAKA ,  Goji Wakamatsu ,  Tsubasa Abe ,  Ichihiro Miura ,  Kengo Ehara ,  Hiroki Nakatsu ,  Hiroki Nakagawa

IPC: G03F7/039 ,  G03F7/09 ,  G03F7/20 ,  C08G61/12 ,  C08G61/04

Abstract: A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R1 and R2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R1 and R2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R1 and R2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R1 and R2 bond.