公开(公告)号：US20150323866A1

公开(公告)日：2015-11-12

申请号：US14805703

申请日：2015-07-22

Applicant: JSR CORPORATION

Inventor： Hayato NAMAI ,  Kota NISHINO

IPC: G03F7/038 ,  C07D307/93 ,  C07C59/82 ,  C07D327/04 ,  C07C59/80 ,  C07C59/86 ,  C07D307/33 ,  C07D493/18

CPC classification number: G03F7/039 ,  C07D307/33 ,  C07D307/93 ,  C07D327/04 ,  C07D493/18 ,  C08F12/22 ,  C08F12/32 ,  C08F212/14 ,  C08F220/18 ,  C08F220/28 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325 ,  C08F2220/283 ,  C08F2220/185

Abstract: A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), RP represents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that RP in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that RP in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.

Abstract translation: 辐射敏感性树脂组合物包含：具有包含式（1）所示基团的结构单元的聚合物; 辐射敏感酸发生器; 和有机溶剂。 在式（1）中，RP表示氢原子或一价有机基团，*表示除式（1）表示的基团以外的结构单元的其余部分的结合位点。 优选式（1）中的RP表示一价有机基团，一价有机基团为酸不稳定基团。 还优选式（1）中的RP表示一价有机基团，一价有机基团是酸不稳定基团。