公开(公告)号：US20250116922A1

公开(公告)日：2025-04-10

申请号：US18985206

申请日：2024-12-18

Applicant: JSR CORPORATION

Inventor： Takuya OMIYA ,  Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Yuushi MATSUMURA ,  Nozomi TERADA

IPC: G03F7/004 ,  C08F2/50 ,  C08F20/10

Abstract: A radiation-sensitive resin composition includes a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid, and which has a first structural unit represented by the following formula (1); a radiation-sensitive acid generating agent; and an acid diffusion control agent having a monovalent radiation-sensitive onium cation and a monovalent organic acid anion.