公开(公告)号：US20210263413A9

公开(公告)日：2021-08-26

申请号：US16815075

申请日：2020-03-11

Applicant: JSR CORPORATION

Inventor： Kazuya KIRIYAMA ,  Katsuaki Nishikori ,  Takuhiro Taniguchi ,  Ken Maruyama

IPC: G03F7/039 ,  G03F7/004 ,  C07C309/06 ,  C08L33/06 ,  C08L25/06

Abstract: A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.

公开(公告)号：US20210124263A1

公开(公告)日：2021-04-29

申请号：US17081000

申请日：2020-10-27

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18 ,  C07D317/70 ,  C07C381/12 ,  C07C309/17 ,  C07D327/04 ,  C07C309/12 ,  C07C65/10 ,  C07C59/115 ,  C07C69/63 ,  C07C65/05

Abstract: A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20200341376A1

公开(公告)日：2020-10-29

申请号：US16815075

申请日：2020-03-11

Applicant: JSR CORPORATION

Inventor： Kazuya KIRIYAMA ,  Katsuaki Nishikori ,  Takuhiro Taniguchi ,  Ken Maruyama

IPC: G03F7/039 ,  G03F7/004 ,  C07C309/06 ,  C08L33/06 ,  C08L25/06

Abstract: A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.

公开(公告)号：US20250004375A1

公开(公告)日：2025-01-02

申请号：US18829747

申请日：2024-09-10

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Michihiro MITA ,  Yudai ABE ,  Kazuya KIRIYAMA

IPC: G03F7/039 ,  G03F7/22

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), A1 represents a (m+n+2)-valent aromatic ring group. Both —OH and —COO− are bound to a common benzene ring in A1. Atom to which —OH is bound is located next to an atom to which —COO31 is bound. R1 represents a monovalent group comprising a cyclic (thio)acetal structure. m is an integer of ≥0. n is an integer of ≥0. M+ represents a monovalent organic cation.

公开(公告)号：US20230400767A1

公开(公告)日：2023-12-14

申请号：US18239399

申请日：2023-08-29

Applicant: JSR CORPORATION

Inventor： Takuya OMIYA ,  Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Natsuko KINOSHITA ,  Tetsurou KANEKO

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F212/14 ,  C07C69/54 ,  C08F220/18 ,  C08F220/24 ,  C08F220/22 ,  C08F220/30 ,  C08F220/34

CPC classification number: G03F7/039 ,  G03F7/038 ,  G03F7/0045 ,  C08F212/24 ,  C07C69/54 ,  C08F220/1805 ,  C08F220/1806 ,  C08F220/1807 ,  C08F220/1808 ,  C08F220/1809 ,  C08F220/24 ,  C08F220/1811 ,  C08F220/22 ,  C08F220/301 ,  C08F220/1812 ,  C08F220/1818 ,  C08F220/34

Abstract: A radiation-sensitive resin composition includes: a polymer including a first structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R2, R3, and R4 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; R5 represents a monovalent organic group having 1 to 20 carbon atoms; and L represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20230236506A2

公开(公告)日：2023-07-27

申请号：US17867739

申请日：2022-07-19

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/029

CPC classification number: G03F7/039 ,  G03F7/029

Abstract: A radiation-sensitive resin composition includes a polymer and a compound. The compound includes a first structural unit including an aromatic carbon ring to which no less than two hydroxy groups bond, and a second structural unit including an acid-labile group which is dissociable by an action of an acid to give a carboxy group. The compound is represented by formula (1). R1 represents a monovalent organic group having 1 to 30 carbon atoms; and X+ represents a monovalent radiation-sensitive onium cation. A weight average molecular weight of the polymer is no greater than 10,000.


R1—COO−X+  (1)

公开(公告)号：US20230244143A9

公开(公告)日：2023-08-03

申请号：US17854048

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Hayato NAMAI ,  Kazuya KIRIYAMA ,  Ken MARUYAMA

IPC: G03F7/039 ,  C08G75/20

CPC classification number: G03F7/0392 ,  C08G75/20

Abstract: A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.

公开(公告)号：US20220413385A1

公开(公告)日：2022-12-29

申请号：US17829432

申请日：2022-06-01

Applicant: JSR CORPORATION

Inventor： Kazuya KIRIYAMA ,  Takuhiro Taniguchi ,  Katsuaki Nishikori ,  Natsuko Kinoshita

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32

Abstract: The radiation-sensitive resin composition contains: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid, and which has a structural unit represented by the following formula (1); and a radiation-sensitive acid generating agent. L represents a single bond, —COO—, —O—, or —CONH—. X represents a single bond, —O—, -G-O—, —CH2—, —S—, —SO2—, —NRA—, or —CONH—, wherein G represents a divalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, and RA represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. R2 and R3 each independently represent a halogen atom, a hydroxy group, a sulfanyl group, or an organic group having 1 to 20 carbon atoms.

公开(公告)号：US20220382152A1

公开(公告)日：2022-12-01

申请号：US17867739

申请日：2022-07-19

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/029

Abstract: A radiation-sensitive resin composition includes a polymer and a compound. The compound includes a first structural unit including an aromatic carbon ring to which no less than two hydroxy groups bond, and a second structural unit including an acid-labile group which is dissociable by an action of an acid to give a carboxy group. The compound is represented by formula (1). R1 represents a monovalent organic group having 1 to 30 carbon atoms; and X represents a monovalent radiation-sensitive onium cation. A weight average molecular weight of the polymer is no greater than 10,000. R1—COO−X+(1)

公开(公告)号：US20220269172A1

公开(公告)日：2022-08-25

申请号：US17673952

申请日：2022-02-17

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/004 ,  C08F220/18 ,  C08F220/22

Abstract: Provided are: a radiation-sensitive resin composition, a method of forming a resist pattern, and a polymer which enable forming a resist pattern with favorable sensitivity to exposure light and superiority in terms of CDU performance and resolution. The radiation-sensitive resin composition contains: a polymer having: a first structural unit represented by formula (1), and a second structural unit derived from a (meth)acrylic acid ester including an acid-labile group; and a radiation-sensitive acid generator.