THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME
    1.
    发明申请
    THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME 审中-公开
    薄膜晶体管及其制造方法

    公开(公告)号:US20130280859A1

    公开(公告)日:2013-10-24

    申请号:US13977725

    申请日:2011-11-23

    IPC分类号: H01L29/66

    摘要: Provided are a thin film transistor and a method of manufacturing the same. The thin film transistor includes: a gate electrode; source and drain electrodes spaced apart in a up and down direction from the gate electrode and in a horizontal direction from each other; a gate dielectric formed between the gate electrode and the source electrode and between the gate electrode and the drain electrode; and an active layer formed between the gate dielectric and the source electrode and between the gate dielectric and the drain electrode, wherein the active layer is formed of at least two zinc oxide thin layers doped with an element.

    摘要翻译: 提供一种薄膜晶体管及其制造方法。 薄膜晶体管包括:栅电极; 源电极和漏电极在上下方向上从栅电极彼此间隔开,并且在水平方向彼此间隔开; 在所述栅电极和所述源电极之间以及所述栅电极和所述漏极之间形成的栅极电介质; 以及形成在所述栅极电介质和所述源极之间以及所述栅极电介质和所述漏极之间的有源层,其中所述有源层由掺杂有元素的至少两个氧化锌薄层形成。