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公开(公告)号:US20130280859A1
公开(公告)日:2013-10-24
申请号:US13977725
申请日:2011-11-23
申请人: Jae-Ho Kim , Dong-Gun Oh , Do-Hyun Choi , Jin-Wook Moon
发明人: Jae-Ho Kim , Dong-Gun Oh , Do-Hyun Choi , Jin-Wook Moon
IPC分类号: H01L29/66
CPC分类号: H01L29/66969 , H01L29/7869 , H01L29/78696
摘要: Provided are a thin film transistor and a method of manufacturing the same. The thin film transistor includes: a gate electrode; source and drain electrodes spaced apart in a up and down direction from the gate electrode and in a horizontal direction from each other; a gate dielectric formed between the gate electrode and the source electrode and between the gate electrode and the drain electrode; and an active layer formed between the gate dielectric and the source electrode and between the gate dielectric and the drain electrode, wherein the active layer is formed of at least two zinc oxide thin layers doped with an element.
摘要翻译: 提供一种薄膜晶体管及其制造方法。 薄膜晶体管包括:栅电极; 源电极和漏电极在上下方向上从栅电极彼此间隔开,并且在水平方向彼此间隔开; 在所述栅电极和所述源电极之间以及所述栅电极和所述漏极之间形成的栅极电介质; 以及形成在所述栅极电介质和所述源极之间以及所述栅极电介质和所述漏极之间的有源层,其中所述有源层由掺杂有元素的至少两个氧化锌薄层形成。
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公开(公告)号:US20050012248A1
公开(公告)日:2005-01-20
申请号:US10495742
申请日:2002-11-29
申请人: Seung Yi , Kyung Choi , Do-Hyun Choi , Seong Im , Byung Byun
发明人: Seung Yi , Kyung Choi , Do-Hyun Choi , Seong Im , Byung Byun
IPC分类号: B32B27/06 , B32B38/00 , G02F1/1333 , G09F9/00 , G09F9/30 , H01L51/50 , H01L51/52 , H05B33/04 , H01S3/00 , B29C71/02 , B29C71/04
CPC分类号: G02F1/133305 , B32B38/0036 , B32B2038/0048 , B32B2307/412 , B32B2307/7244 , G02F1/133345 , H01L51/5256 , H01L51/5259
摘要: Disclosed is a method of fabricating a transparent plastic display substrate having a barrier layer enabling to prevent the penetration of oxygen and moisture without causing damage on a substrate by annealing a surface of the barrier layer locally. The present invention includes the steps of forming a silicon based barrier layer on a transparent plastic substrate and annealing the barrier layer locally.
摘要翻译: 公开了一种制造具有阻挡层的透明塑料显示基板的方法,该屏障层能够通过局部退火势垒层的表面而防止氧气和水分的渗透而不会对基板造成损坏。 本发明包括在透明塑料基板上形成硅基阻挡层并局部退火阻挡层的步骤。
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