公开(公告)号：US20130226336A1

公开(公告)日：2013-08-29

申请号：US13594750

申请日：2012-08-24

申请人： James Hoffman ,  Hong Soon Kim ,  Atsushi Kitani

发明人： James Hoffman ,  Hong Soon Kim ,  Atsushi Kitani

IPC分类号： B25J9/16

CPC分类号： B25J9/1656 ,  G05B19/41865 ,  G05B2219/32258 ,  G05B2219/32271 ,  G05B2219/32283 ,  G05B2219/32291 ,  G05B2219/32304 ,  G05B2219/45031 ,  Y02P90/20 ,  Y10T29/41

摘要： Systems, methods, and apparatus are provided for operating a cluster tool including receiving recipe time data; receiving transfer time data; receiving process programs and associated substrate lots wherein the process programs include a plurality of sequences; determining cluster tool chambers associated with sequences that are bottleneck sequences; setting equipment constant values for components of the cluster tool to implement transfer priorities wherein the chambers associated with bottleneck sequences are given highest priority; executing a next sequence based on the transfer priorities; and repeating the determining, setting and executing for each remaining sequence. Numerous additional aspects are disclosed.

摘要翻译： 提供了用于操作集群工具的系统，方法和装置，包括接收配方时间数据; 接收传输时间数据; 接收过程程序和相关的衬底批次，其中过程程序包括多个序列; 确定与作为瓶颈序列的序列相关联的簇工具室; 为集群工具的组件设置设备常数值以实现转移优先级，其中与瓶颈序列相关联的室被赋予最高优先级; 基于传送优先级执行下一个序列; 并重复确定，设置和执行每个剩余的序列。 公开了许多附加方面。

公开(公告)号：US09008833B2

公开(公告)日：2015-04-14

申请号：US13594750

申请日：2012-08-24

申请人： James Hoffman ,  Hong Soon Kim ,  Atsushi Kitani

发明人： James Hoffman ,  Hong Soon Kim ,  Atsushi Kitani

IPC分类号： G06F7/00 ,  B25J9/16 ,  G05B19/418

CPC分类号： B25J9/1656 ,  G05B19/41865 ,  G05B2219/32258 ,  G05B2219/32271 ,  G05B2219/32283 ,  G05B2219/32291 ,  G05B2219/32304 ,  G05B2219/45031 ,  Y02P90/20 ,  Y10T29/41

摘要： Systems, methods, and apparatus are provided for operating a cluster tool including receiving recipe time data; receiving transfer time data; receiving process programs and associated substrate lots wherein the process programs include a plurality of sequences; determining cluster tool chambers associated with sequences that are bottleneck sequences; setting equipment constant values for components of the cluster tool to implement transfer priorities wherein the chambers associated with bottleneck sequences are given highest priority; executing a next sequence based on the transfer priorities; and repeating the determining, setting and executing for each remaining sequence. Numerous additional aspects are disclosed.

摘要翻译： 提供了用于操作集群工具的系统，方法和装置，包括接收配方时间数据; 接收传输时间数据; 接收过程程序和相关的衬底批次，其中过程程序包括多个序列; 确定与作为瓶颈序列的序列相关联的簇工具室; 为集群工具的组件设置设备常数值以实现转移优先级，其中与瓶颈序列相关联的室被赋予最高优先级; 基于传送优先级执行下一个序列; 并重复确定，设置和执行每个剩余的序列。 公开了许多附加方面。

公开(公告)号：US08674844B2

公开(公告)日：2014-03-18

申请号：US12661699

申请日：2010-03-19

申请人： Beom Soo Park ,  Hong Soon Kim ,  Soo Young Choi ,  James Hoffman ,  Suhail Anwar ,  John M. White

发明人： Beom Soo Park ,  Hong Soon Kim ,  Soo Young Choi ,  James Hoffman ,  Suhail Anwar ,  John M. White

IPC分类号： G08B21/00

CPC分类号： H01J37/32183 ,  H01J37/32935 ,  H01J37/3299

摘要： Malfunction of a component within an RF-powered plasma chamber is detected by observing an operating condition of the plasma chamber and detecting when the operating condition deviates from a previously observed range bounded by lower and upper limits. The lower and upper limits are determined by observing the minimum and maximum values of that operating condition during the processing of workpieces throughout one or more plasma chamber cleaning cycles immediately preceding the most recent cleaning of the plasma chamber.

摘要翻译： 通过观察等离子体室的操作状态并检测何时操作条件偏离由下限和上限限定的先前观察范围，来检测RF供电的等离子体室内部件的故障。 通过在紧邻等离子体室的最近清洁之前的一个或多个等离子体室清洁循环期间观察工件处理期间该操作条件的最小值和最大值来确定下限和上限。

公开(公告)号：US08670857B2

公开(公告)日：2014-03-11

申请号：US13019838

申请日：2011-02-02

申请人： Hong Soon Kim ,  James Hoffman ,  Beom Soo Park

发明人： Hong Soon Kim ,  James Hoffman ,  Beom Soo Park

IPC分类号： G06F19/00

CPC分类号： G06F19/00

摘要： The present invention generally relates to a method for flexible process condition monitoring. In a process that utilizes RF power, the RF power may be applied at different levels during different points in the process. Software may be programmed to facilitate the monitoring of the different points in the process so that the acceptable deviation range of the RF power for each point in the process may be set to different values. For example, one phase of the process may permit a greater range of RF power deviation while a second phase may be much more particular and permit very little deviation. By programming software to permit each phase of the process to be uniquely monitored, a more precise RF process may be obtained.

摘要翻译： 本发明一般涉及一种用于灵活处理状态监测的方法。 在利用RF功率的过程中，RF功率可以在该过程的不同点处以不同的电平施加。 可以对软件进行编程以促进对该过程中的不同点的监视，使得该过程中每个点的RF功率的可接受的偏差范围可以被设置为不同的值。 例如，该过程的一个阶段可以允许较大范围的RF功率偏差，而第二阶段可能更加特别，并允许非常小的偏差。 通过编程软件来允许对过程的每个阶段进行唯一的监控，可以获得更精确的RF过程。

公开(公告)号：US07902991B2

公开(公告)日：2011-03-08

申请号：US11682290

申请日：2007-03-05

申请人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

发明人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

IPC分类号： G08B21/00

CPC分类号： H01J37/32174 ,  H01J37/32935 ,  H03H7/40

摘要： Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

摘要翻译： 通过检测可变频率RF电源的频率是否移动到建立的下限和上限之外，来检测RF供电的等离子体处理室内的异常情况。 在第一方面，根据在新处理步骤开始之后或在采样控制信号改变状态之后采样的电源的频率，建立第一对下限和上限。 在第二方面，第二对下限和上限不适合电源的频率。 两个方面优选一起用于检测异常状况的不同出现。

公开(公告)号：US08174400B2

公开(公告)日：2012-05-08

申请号：US13042408

申请日：2011-03-07

申请人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

发明人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

IPC分类号： G08B21/00

CPC分类号： H01J37/32174 ,  H01J37/32935 ,  H03H7/40

摘要： Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

摘要翻译： 通过检测可变频率RF电源的频率是否移动到建立的下限和上限之外，来检测RF供电的等离子体处理室内的异常情况。 在第一方面，根据在新处理步骤开始之后或在采样控制信号改变状态之后采样的电源的频率，建立第一对下限和上限。 在第二方面，第二对下限和上限不适合电源的频率。 两个方面优选一起用于检测异常状况的不同出现。

公开(公告)号：US20100245084A1

公开(公告)日：2010-09-30

申请号：US12661699

申请日：2010-03-19

申请人： Beom Soo Park ,  Hong Soon Kim ,  Soo Young Choi ,  James Hoffman ,  Suhail Anwar ,  John M. White

发明人： Beom Soo Park ,  Hong Soon Kim ,  Soo Young Choi ,  James Hoffman ,  Suhail Anwar ,  John M. White

IPC分类号： G08B21/00

CPC分类号： H01J37/32183 ,  H01J37/32935 ,  H01J37/3299

摘要： Malfunction of a component within an RF-powered plasma chamber is detected by observing an operating condition of the plasma chamber and detecting when the operating condition deviates from a previously observed range bounded by lower and upper limits. The lower and upper limits are determined by observing the minimum and maximum values of that operating condition during the processing of workpieces throughout one or more plasma chamber cleaning cycles immediately preceding the most recent cleaning of the plasma chamber.

摘要翻译： 通过观察等离子体室的操作状态并检测何时操作条件偏离由下限和上限限定的先前观察范围，来检测RF供电的等离子体室内部件的故障。 通过在紧邻等离子体室的最近清洁之前的一个或多个等离子体室清洁循环期间观察工件处理期间该操作条件的最小值和最大值来确定下限和上限。

公开(公告)号：US20110241892A1

公开(公告)日：2011-10-06

申请号：US13042408

申请日：2011-03-07

申请人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

发明人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

IPC分类号： G08B21/00 ,  G01R13/14

CPC分类号： H01J37/32174 ,  H01J37/32935 ,  H03H7/40

摘要： Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

摘要翻译： 通过检测可变频率RF电源的频率是否移动到建立的下限和上限之外，来检测RF供电的等离子体处理室内的异常情况。 在第一方面，根据在新处理步骤开始之后或在采样控制信号改变状态之后采样的电源的频率，建立第一对下限和上限。 在第二方面，第二对下限和上限不适合电源的频率。 两个方面优选一起用于检测异常状况的不同出现。

公开(公告)号：US20110190921A1

公开(公告)日：2011-08-04

申请号：US13019838

申请日：2011-02-02

申请人： Hong Soon Kim ,  James Hoffman ,  Beom Soo Park

发明人： Hong Soon Kim ,  James Hoffman ,  Beom Soo Park

IPC分类号： G06F19/00

CPC分类号： G06F19/00

摘要： The present invention generally relates to a method for flexible process condition monitoring. In a process that utilizes RF power, the RF power may be applied at different levels during different points in the process. Software may be programmed to facilitate the monitoring of the different points in the process so that the acceptable deviation range of the RF power for each point in the process may be set to different values. For example, one phase of the process may permit a greater range of RF power deviation while a second phase may be much more particular and permit very little deviation. By programming software to permit each phase of the process to be uniquely monitored, a more precise RF process may be obtained.

摘要翻译： 本发明一般涉及一种用于灵活处理状态监测的方法。 在利用RF功率的过程中，RF功率可以在该过程的不同点处以不同的电平施加。 可以对软件进行编程以促进对该过程中的不同点的监视，使得该过程中每个点的RF功率的可接受的偏差范围可以被设置为不同的值。 例如，该过程的一个阶段可以允许较大范围的RF功率偏差，而第二阶段可能更加特别，并允许非常小的偏差。 通过编程软件来允许对过程的每个阶段进行唯一的监控，可以获得更精确的RF过程。

公开(公告)号：US20080074255A1

公开(公告)日：2008-03-27

申请号：US11682290

申请日：2007-03-05

申请人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

发明人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

IPC分类号： G08B21/00

CPC分类号： H01J37/32174 ,  H01J37/32935 ,  H03H7/40

摘要： Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

摘要翻译： 通过检测可变频率RF电源的频率是否移动到建立的下限和上限之外，来检测RF供电的等离子体处理室内的异常情况。 在第一方面，根据在新处理步骤开始之后或在采样控制信号改变状态之后采样的电源的频率，建立第一对下限和上限。 在第二方面，第二对下限和上限不适合电源的频率。 两个方面优选一起用于检测异常状况的不同出现。