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1.发明授权Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer 失效用于消除化学放大光致抗蚀剂中的微桥接的组合物，其包含聚（羟基苯乙烯）和由羟基苯乙烯制成的共聚物和丙烯酸单体的聚合物共混物
公开(公告)号：US5547812A
公开(公告)日：1996-08-20
申请号：US464229
申请日：1995-06-05
申请人： James P. Collins , Judy Dorn , James T. Fahey , Leo Linehan , William J. Miller , Wayne Moreau , Erik A. Puttlitz , Randolph Smith , Gary Spinillo
发明人： James P. Collins , Judy Dorn , James T. Fahey , Leo Linehan , William J. Miller , Wayne Moreau , Erik A. Puttlitz , Randolph Smith , Gary Spinillo
IPC分类号： G03F7/004 , C08F12/22 , C08F212/00 , C08L25/00 , C08L25/18 , C08L33/04 , G03F7/038 , H01L21/027
CPC分类号： G03F7/038 , Y10S430/11 , Y10S430/111
摘要： Microbridge formation in chemically amplified negative tone photoresists based on poly(hydroxystyrene) (PHS) is avoided when the PHS is blended together with a co-polymer of PHS and an acrylic polymer such as poly(methyl methacrylate) (PMMA). The blend should include at least 10% by weight of the co-polymer. In operation, hydrogen bonding between the hydroxystyrene sub-units and the methacrylate sub-units decreases the availability of sites for crosslinking, and this reduction in crosslinking sites makes the blend less susceptible to formation of polymer resist microbridges. The invention is practicable with a polymers having a wide range of molecular weights (2000-50000 daltons), and development can be achieved using the industry standard 2.38 wt % trimethylammonium hydroxide (TMAH) developer without any adverse impact on the photoresist.
摘要翻译： 当PHS与PHS的共聚物和聚（甲基丙烯酸甲酯）（PMMA）等丙烯酸聚合物共混时，避免了基于聚（羟基苯乙烯）（PHS）的化学放大负色调光致抗蚀剂中的微桥形成。 共混物应包含至少10重量％的共聚物。 在操作中，羟基苯乙烯亚单元和甲基丙烯酸酯亚单位之间的氢键结合降低了用于交联的位点的可用性，并且交联位置的这种减少使得共混物不易形成聚合物抗蚀剂微桥。 本发明对于具有广泛分子量（2000-50000道尔顿）的聚合物是可行的，并且可以使用工业标准的2.38重量％的三甲基氢氧化铵（TMAH）显影剂实现显影，而对光致抗蚀剂没有任何不利影响。
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公开(公告)号：US09490157B2
公开(公告)日：2016-11-08
申请号：US12384015
申请日：2009-03-31
IPC分类号： B24B37/04 , H01L21/687 , C23C16/34 , C23C16/458 , C30B25/12 , H01L21/673
CPC分类号： H01L21/68735 , C23C16/345 , C23C16/4581 , C30B25/12 , H01L21/67306 , H01L21/67309 , H01L21/68757 , H01L21/68785
摘要： Semiconductor processing and equipment are disclosed. The semiconductor equipment and processing provide semiconductor wafers with reduced defects.
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公开(公告)号：US07615335B2
公开(公告)日：2009-11-10
申请号：US11378919
申请日：2006-03-17
IPC分类号： G03C1/00
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
摘要翻译： 公开了一种成像方法。 将成像组合物涂覆在工件上，然后从3-D成像系统施加足够量的能量以在涂覆的工件上形成图像。 图像可以是用于对准部件的标志或标记。
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公开(公告)号：US5554485A
公开(公告)日：1996-09-10
申请号：US315271
申请日：1994-09-29
申请人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
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公开(公告)号：US5401614A
公开(公告)日：1995-03-28
申请号：US17938
申请日：1993-02-16
申请人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
发明人： Robert R. Dichiara , James T. Fahey , Pamela E. Jones , Christopher F. Lyons , Wayne M. Moreau , Ratnam Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
IPC分类号： G03F7/11 , G03F7/09 , H01L21/027 , H01L21/30 , G03C5/00
CPC分类号： G03F7/091 , Y10S522/904
摘要： An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物，其包含对中和深紫外线辐射具有高度吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且其不溶于用于化学 放大的光致抗蚀剂组合物。
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公开(公告)号：US08048606B2
公开(公告)日：2011-11-01
申请号：US11378933
申请日：2006-03-17
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
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公开(公告)号：US07977026B2
公开(公告)日：2011-07-12
申请号：US10773989
申请日：2004-02-06
IPC分类号： G03C1/00
CPC分类号： G03C1/73 , G03C1/732 , Y10S430/146 , Y10S430/155
摘要： An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
摘要翻译： 公开了一种成像方法。 将成像组合物涂覆在工件上，然后从3-D成像系统施加足够量的能量以在涂覆的工件上形成图像。 图像可以是用于对准部件的标志或标记。
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8.发明申请PERIPHERAL DATA STORAGE DEVICE WITH DOCK CHARGE PASS-THROUGH CONNECTOR AND OPTIONAL MICROSD SLOTS AND ACCOMPANYING DEVICE AND HOST SOFTWARE FOR APPLE IPHONE AND IPOD DEVICES 有权外围数据存储设备，具有通过连接器和可选的微型插槽的充电数据存储设备，以及苹果IPOONE和IPOD设备的附带设备和主机软件公开(公告)号：US20100220435A1
公开(公告)日：2010-09-02
申请号：US12581768
申请日：2009-10-19
IPC分类号： G06F1/16
CPC分类号： G06F1/1632 , G06F2200/1635
摘要： A peripheral data storage device for Apple iPhone and iPod devices having an encasement containing a system of electronic circuits which communicates with the iPhone or iPod by means of a host software system and a device software system. The device also has a charge pass through connector and optional card slots. Various views of the device are shown in FIGS. 1-5.
摘要翻译： 一种用于Apple iPhone和iPod设备的外围数据存储设备，其具有包含通过主机软件系统和设备软件系统与iPhone或iPod进行通信的电子电路系统的外壳。 该设备还具有充电通过连接器和可选卡槽。 装置的各种视图如图1和2所示。 1-5。
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公开(公告)号：US08879246B2
公开(公告)日：2014-11-04
申请号：US13620724
申请日：2012-09-15
IPC分类号： G06F1/16
CPC分类号： G06F1/1632 , G06F2200/1635
摘要： A peripheral data storage device for IPHONE mobile phone and IPOD media player devices having an encasement containing a system of electronic circuits which communicates with the IPHONE mobile phone or IPOD media player by means of a host software system and a device software system. The device also has a charge pass through connector and optional card slots. Various views of the device are shown in FIGS. 1-5.
摘要翻译： 一种用于IPHONE移动电话和IPOD媒体播放器设备的外围数据存储设备，其具有包含通过主机软件系统和设备软件系统与IPHONE移动电话或IPOD媒体播放器通信的电子电路系统的外壳。 该设备还具有充电通过连接器和可选卡槽。 装置的各种视图如图1和2所示。 1-5。
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公开(公告)号：US20130010421A1
公开(公告)日：2013-01-10
申请号：US13620724
申请日：2012-09-15
IPC分类号： G06F1/16
CPC分类号： G06F1/1632 , G06F2200/1635
摘要： A peripheral data storage device for IPHONE mobile phone and IPOD media player devices having an encasement containing a system of electronic circuits which communicates with the IPHONE mobile phone or IPOD media player by means of a host software system and a device software system. The device also has a charge pass through connector and optional card slots. Various views of the device are shown in FIGS. 1-5.
摘要翻译： 一种用于IPHONE移动电话和IPOD媒体播放器设备的外围数据存储设备，其具有包含通过主机软件系统和设备软件系统与IPHONE移动电话或IPOD媒体播放器通信的电子电路系统的外壳。 该设备还具有充电通过连接器和可选卡槽。 装置的各种视图如图1和2所示。 1-5。
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