APPARATUS AND METHOD FOR INSPECTING SUBSTRATE INTERNAL DEFECTS
    1.
    发明申请
    APPARATUS AND METHOD FOR INSPECTING SUBSTRATE INTERNAL DEFECTS 有权
    检查基板内部缺陷的装置和方法

    公开(公告)号:US20110135188A1

    公开(公告)日:2011-06-09

    申请号:US12731662

    申请日:2010-03-25

    IPC分类号: G06K9/00

    CPC分类号: G01N21/9505

    摘要: A method for inspecting substrate internal defects is disclosed. The method provides at least one light source disposed on a lateral side of a substrate and configured to emit a light beam to the lateral side for correspondingly penetrating the substrate. The method also provides an image capturing module for retrieving an image of the upper surface, wherein an incident angle of the light beam to the respective lateral side is limited within a first predetermined angle to allow the light beam to have a total reflection in the substrate. Thus, the light beam is blocked by internal defects when transmitting within the substrate to generate bright spots to be detected by the image capturing module for locating the defect position. The method provides a better image definition of internal defects images. The present invention further provides an apparatus based on the method for inspecting substrate internal defects.

    摘要翻译: 公开了一种用于检查衬底内部缺陷的方法。 该方法提供至少一个光源,其设置在基板的横向侧上并且被配置为向侧面发射光束以相应地穿透基板。 该方法还提供了一种用于检索上表面的图像的图像捕获模块,其中光束到相应横向侧的入射角被限制在第一预定角度内,以允许光束在基板中具有全反射 。 因此,当在衬底内传输时,光束被内部缺陷阻挡,以产生用于定位缺陷位置的图像捕获模块要检测的亮点。 该方法为内部缺陷图像提供了更好的图像定义。 本发明还提供一种基于检查衬底内部缺陷的方法的装置。