公开(公告)号：US07239163B1

公开(公告)日：2007-07-03

申请号：US11156022

申请日：2005-06-17

申请人： Jeremy John Ralston-Good ,  Philipp S. Spuhler ,  Bert M. Vermeire ,  Douglas Leonard Goodman

发明人： Jeremy John Ralston-Good ,  Philipp S. Spuhler ,  Bert M. Vermeire ,  Douglas Leonard Goodman

IPC分类号： G01R31/02

CPC分类号： G01R31/2884

摘要： A die-level process monitor (DLPM) provides a means for independently determining whether an IC malfunction is a result of the design or the manufacturing processing and further for gathering data on specific process parameters. The DLPM senses parameter variations that result from manufacturing process drift and outputs a measure of the process parameter. The DLPM will typically sense the mismatch of process parameters between two or more test devices as a measure of process variation between a like pair of production devices. The DLPM may be used as a diagnostic tool to determine why an IC failed to perform within specification or to gather statistics on measured process parameters for a given foundry or process.

摘要翻译： 裸片级过程监视器（DLPM）提供了一种用于独立地确定IC故障是由设计或制造处理的结果以及进一步收集关于特定工艺参数的数据的手段。 DLPM感测由制造过程漂移产生的参数变化，并输出过程参数的度量。 DLPM通常将感测两个或多个测试设备之间的过程参数的不匹配，作为类似的一对生产设备之间的过程变化的量度。 DLPM可用作诊断工具，以确定IC在规格范围内无法执行的原因，或者收集关于给定代工厂或过程的测量过程参数的统计信息。