公开(公告)号：US20070090304A1

公开(公告)日：2007-04-26

申请号：US10570535

申请日：2004-09-01

申请人： Jeroen Jonkers ,  Dominik Vaudrevange ,  Willi Neff

发明人： Jeroen Jonkers ,  Dominik Vaudrevange ,  Willi Neff

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).

摘要翻译： 一种通过电操作的放电产生极紫外辐射（EUV）或软X射线辐射的方法，特别是用于EUV光刻或计量的方法，其中等离子体（22）在气体介质中点燃至少两个 放电空间（12）中的电极（14,16），所述等离子体发射要产生的辐射。 气体介质由金属熔体（24）产生，金属熔体（24）施加到所述放电空间（12）中的表面，并且至少部分地被能量束，特别是激光束（20）蒸发。

公开(公告)号：US07468521B2

公开(公告)日：2008-12-23

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21G5/00 ,  G01J3/10 ,  G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US07323701B2

公开(公告)日：2008-01-29

申请号：US10525136

申请日：2003-08-11

申请人： Dominik Vaudrevange ,  Klaus Bergmann

发明人： Dominik Vaudrevange ,  Klaus Bergmann

IPC分类号： G01J3/10

CPC分类号： H05G2/003

摘要： A gas discharge lamp for the wavelength range of extreme ultraviolet radiation and/or soft X-ray radiation has at least two electrodes for providing a radiaton-emitting plasma in the intervening discharge space. One of the electrodes has a continuous opening to an adjoining outer region where charge carriers can be generated which can be transported through the opening in to the discharge space. The electrode opening narrows in the direction of the outer region.

摘要翻译： 用于极紫外辐射和/或软X射线辐射的波长范围的气体放电灯具有至少两个用于在中间放电空间中提供辐射发射等离子体的电极。 电极中的一个具有连续的开口，邻接的外部区域可以产生能够通过开口传送到放电空间的电荷载体。 电极开口在外部区域的方向上变窄。

公开(公告)号：US20070146659A1

公开(公告)日：2007-06-28

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

发明人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US20060113498A1

公开(公告)日：2006-06-01

申请号：US10525136

申请日：2003-08-11

申请人： Dominik Vaudrevange ,  Klaus Bergmann

发明人： Dominik Vaudrevange ,  Klaus Bergmann

IPC分类号： G01J3/10

CPC分类号： H05G2/003

摘要： The invention relates to a gas discharge lamp for the wavelength range of extreme ultraviolet radiation and/or soft X-ray radiation with at least two electrodes for providing a radiation-emitting plasma in the intervening discharge space, wherein one of the electrodes has a continuous opening to an adjoining outer region, in which outer region charge carriers can be generated which can be transported through the opening into the discharge space, characterized in that the electrode opening narrows in the direction of the outer region.

摘要翻译： 本发明涉及一种用于具有至少两个电极的极紫外辐射和/或软X射线辐射的波长范围的气体放电灯，用于在中间放电空间中提供辐射发射等离子体，其中一个电极具有连续的 开口到相邻的外部区域，其中可以产生可以通过开口传送到放电空间的外部区域电荷载体，其特征在于，电极开口在外部区域的方向上变窄。