公开(公告)号：US20090269512A1

公开(公告)日：2009-10-29

申请号：US12110879

申请日：2008-04-28

申请人： Jianhua Zhou ,  Deenesh Padhi ,  Karthik Janakiraman ,  Hang Yu ,  Siu F. Cheng ,  Yoganand Saripalli ,  Tersem Summan

发明人： Jianhua Zhou ,  Deenesh Padhi ,  Karthik Janakiraman ,  Hang Yu ,  Siu F. Cheng ,  Yoganand Saripalli ,  Tersem Summan

IPC分类号： C23C16/44

CPC分类号： C23C16/5096 ,  H01J37/32541 ,  Y10T117/10

摘要： A method and apparatus for adjust local plasma density during a plasma process. One embodiment provides an electrode assembly comprising a conductive faceplate having a nonplanar surface. The nonplanar surface is configured to face a substrate during processing and the conductive faceplate is disposed so that the nonplanar surface is opposing a substrate support having an electrode. The conductive faceplate and the substrate support form a plasma volume. The nonplanar surface is configured to adjust electric field between the conductive plate and the electrode by varying a distance between the conductive plate and the electrode.

摘要翻译： 一种用于在等离子体工艺期间调节局部等离子体密度的方法和装置。 一个实施例提供了一种电极组件，其包括具有非平面表面的导电面板。 非平面表面被配置为在处理期间面向衬底，并且设置导电面板使得非平面表面与具有电极的衬底支撑件相对。 导电面板和基板支撑件形成等离子体体积。 非平面被配置为通过改变导电板和电极之间的距离来调节导电板和电极之间的电场。

公开(公告)号：US08097082B2

公开(公告)日：2012-01-17

申请号：US12110879

申请日：2008-04-28

申请人： Jianhua Zhou ,  Deenesh Padhi ,  Karthik Janakiraman ,  Hang Yu ,  Siu F. Cheng ,  Yoganand Saripalli ,  Tersem Summan

发明人： Jianhua Zhou ,  Deenesh Padhi ,  Karthik Janakiraman ,  Hang Yu ,  Siu F. Cheng ,  Yoganand Saripalli ,  Tersem Summan

IPC分类号： C23C16/50

CPC分类号： C23C16/5096 ,  H01J37/32541 ,  Y10T117/10

摘要： A method and apparatus for adjust local plasma density during a plasma process. One embodiment provides an electrode assembly comprising a conductive faceplate having a nonplanar surface. The nonplanar surface is configured to face a substrate during processing and the conductive faceplate is disposed so that the nonplanar surface is opposing a substrate support having an electrode. The conductive faceplate and the substrate support form a plasma volume. The nonplanar surface is configured to adjust electric field between the conductive plate and the electrode by varying a distance between the conductive plate and the electrode.

摘要翻译： 一种用于在等离子体工艺期间调节局部等离子体密度的方法和装置。 一个实施例提供了一种电极组件，其包括具有非平面表面的导电面板。 非平面表面被配置为在处理期间面向衬底，并且设置导电面板使得非平面表面与具有电极的衬底支撑件相对。 导电面板和基板支撑件形成等离子体体积。 非平面被配置为通过改变导电板和电极之间的距离来调节导电板和电极之间的电场。