公开(公告)号：US20100108875A1

公开(公告)日：2010-05-06

申请号：US10576254

申请日：2004-10-14

申请人： Jiro Naka ,  Hiroshi Kurokawa ,  Junji Kobayashi ,  Satoru Toyama ,  Noriko Hirano ,  Eiji Hara

发明人： Jiro Naka ,  Hiroshi Kurokawa ,  Junji Kobayashi ,  Satoru Toyama ,  Noriko Hirano ,  Eiji Hara

IPC分类号： H01J49/26 ,  B01D59/44

CPC分类号： G01N1/4055 ,  G01N33/442 ,  G01N2001/4061 ,  G01N2030/009 ,  Y10T436/24

摘要： A sample preparation for analyzing a minute quantity of a content included in a material is performed by short-time extraction treatment without long-time extraction treatment, and the minute quantity of the content in the material is rapidly analyzed. The method of analyzing a minute quantity of a content includes mounting on a sample table a sample piece of a material to be analyzed; dropping onto the sample table the solvent for extracting the content from the sample piece, and injecting the solvent into a gap between the sample table and the sample piece; maintaining at room temperature the solvent injected into the gap between the sample table and the sample piece, and, with the solvent maintained in the gap between the sample table and the sample piece, extracting the content from the sample piece; and analyzing the content extracted from the sample piece.

摘要翻译： 通过不进行长时间提取处理的短时间提取处理来进行用于分析材料中包含的微量的含量的样品制剂，并且快速分析材料中的微量的含量。 分析微量内容的方法包括在样品台上安装待分析材料的样品片; 在样品台上滴加用于从样品中提取含量的溶剂，并将溶剂注入到样品台和样品片之间的间隙中; 在室温下保持注入到样品台和样品片之间的间隙中的溶剂，并且将溶剂保持在样品台和样品片之间的间隙中，从样品中提取含量; 并分析从样品片提取的内容。

公开(公告)号：US08796033B2

公开(公告)日：2014-08-05

申请号：US10576254

申请日：2004-10-14

申请人： Jiro Naka ,  Hiroshi Kurokawa ,  Junji Kobayashi ,  Satoru Toyama ,  Noriko Hirano ,  Eiji Hara

发明人： Jiro Naka ,  Hiroshi Kurokawa ,  Junji Kobayashi ,  Satoru Toyama ,  Noriko Hirano ,  Eiji Hara

IPC分类号： G01N33/44 ,  G01N1/40 ,  G01N30/00

CPC分类号： G01N1/4055 ,  G01N33/442 ,  G01N2001/4061 ,  G01N2030/009 ,  Y10T436/24

摘要： A method for analyzing a minute quantity of a material included in a different material is performed in short extraction treatment without taking a long time and the minute content is rapidly analyzed. The method of analyzing a minute content includes mounting on a sample table a sample piece of a material having a minute content of a different material to be analyzed; dropping onto the sample table a solvent for extracting the minute content from the sample piece, so that the solvent is disposed between the sample table and the sample piece; maintaining at room temperature the solvent between the sample table and the sample piece, and, with the solvent maintained between the sample table and the sample piece, extracting the material of the minute content from the sample piece; and analyzing the content extracted from the sample piece.

摘要翻译： 用于分析不同材料中所含材料的微量的方法在短时间提取处理中进行，而不需要较长时间并且分析内容得到快速分析。 分析微小内容的方法包括在样品台上安装具有不同材料的微量含量的待分析材料的样品片; 在样品台上滴加用于从样品片中提取微量的溶剂，使溶剂置于样品台和样品片之间; 在室温下保持样品台和样品片之间的溶剂，并将溶剂保持在样品台和样品片之间，从样品中提取微量的物质; 并分析从样品片提取的内容。

公开(公告)号：US06182675B2

公开(公告)日：2001-02-06

申请号：US09030818

申请日：1998-02-26

申请人： Jiro Naka ,  Naohiko Fujino ,  Noriko Hirano ,  Junji Kobayashi ,  Kazuo Kuramoto

发明人： Jiro Naka ,  Naohiko Fujino ,  Noriko Hirano ,  Junji Kobayashi ,  Kazuo Kuramoto

IPC分类号： B08B302

CPC分类号： H01L21/67057 ,  H01L21/67051 ,  H01L22/12 ,  Y10S134/902

摘要： A method for recovering impurities on a surface of a silicon wafer includes a first step of using a pretreatment solution to decompose an oxide film, a nitride film on an oxynitridation film formed at a peripheral portion on a surface of a silicon wafer and to remove impurities on the peripheral portion and a second step of recovering impurities on the surface of the wafer expect for the peripheral portion.

摘要翻译： 在硅晶片的表面上回收杂质的方法包括使用预处理溶液分解氧化膜的第一步骤，形成在硅晶片表面的周边部分上的氧氮化膜上的氮化物膜和除去杂质 并且在周边部分期望回收晶片表面上的杂质的第二步骤。