公开(公告)号：US20070085043A1

公开(公告)日：2007-04-19

申请号：US11253054

申请日：2005-10-19

申请人： Johannes Leonardus Franken ,  Alexander Struycken ,  Leon Marie Van Den Schoor

发明人： Johannes Leonardus Franken ,  Alexander Struycken ,  Leon Marie Van Den Schoor

IPC分类号： G01J3/10

CPC分类号： G03F7/70891 ,  F24S10/90 ,  F24S23/70 ,  F24S40/50 ,  G02B7/1815 ,  G03F7/70175

摘要： A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period

摘要翻译： 一种光刻设备，包括收集器，其被构造为接收来自辐射源的辐射并将辐射传输到照明系统，其中所述收集器设置有至少一个流体管道，所述设备包括温度调节器，以利用所述流体热收集器 收集器的管道，温度调节器构造成在第一时段期间将第一流体供应到流体管道，并且在至少第二时段期间将第二流体供给到流体管道

公开(公告)号：US20050157284A1

公开(公告)日：2005-07-21

申请号：US10758270

申请日：2004-01-16

申请人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

发明人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

IPC分类号： G02B17/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。

公开(公告)号：US20060175558A1

公开(公告)日：2006-08-10

申请号：US11051477

申请日：2005-02-07

申请人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

发明人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

IPC分类号： G03B7/20

CPC分类号： G03F7/70175 ,  G03F7/70916

摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

摘要翻译： 用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。 光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。 辐射收集器被周向壳体和气体屏障包围。 入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。