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公开(公告)号:US20160196932A1
公开(公告)日:2016-07-07
申请号:US14988626
申请日:2016-01-05
申请人: Johnny Duc Van CHIEM
发明人: Johnny Duc Van CHIEM
摘要: A method of manufacturing trenched electrochemical double layer capacitors is provided. One aspect of the method employs state-of-the art processes used in semi-conductor wafer manufacturing such as photolithography etching for creating trenches in the electrodes of the double layer capacitor. Another aspect of the method employs a die-saw process, which is scalable and low-cost. The trenched super/ultra capacitors made by the disclosed methods have the combined advantage of higher energy storage capacity than conventional planar super/ultra capacitors due to the increased surface area and higher power density than commonly used Li-ion batteries due to the faster charging time and higher instantaneous energy burst power. The manufacturing processes also have the advantage of better manufacturability, scalability and reduced manufacturing cost.
摘要翻译: 提供一种制造沟槽电化学双层电容器的方法。 该方法的一个方面采用半导体晶片制造中使用的最先进的方法,例如用于在双层电容器的电极中产生沟槽的光刻蚀刻。 该方法的另一方面采用可视化和低成本的模锯工艺。 通过所公开的方法制造的沟槽式超/超电容器具有比常规平面超/超级电容器更高的能量存储容量的组合优点,这是由于比通常使用的锂离子电池增加的表面积和更高的功率密度,这是由于更快的充电时间 和更高的瞬时能量突发功率。 制造工艺也具有更好的可制造性,可扩展性和降低制造成本的优点。