SUBSTRATE INSPECTION METHOD
    2.
    发明申请
    SUBSTRATE INSPECTION METHOD 审中-公开
    基板检查方法

    公开(公告)号:US20130194569A1

    公开(公告)日:2013-08-01

    申请号:US13879597

    申请日:2011-10-13

    IPC分类号: G01N21/93

    摘要: A substrate inspection apparatus for inspecting a substrate, on which a measurement object is formed, is shown. The substrate inspection method includes measuring a substrate, on which a measurement object is formed, generating a plane equation of the substrate, and acquiring a region of the measurement object formed on the substrate. After, by considering a height of measurement object a region of the measurement object is converted into a substrate plane by plane equation,. Then, the measurement object is inspected based on a region of the measurement object converted into a substrate plane by plane equation and a region of the measurement object by reference data. Therefore, an offset value of a measurement object is acquired according to a tilted pose of the substrate, and a distortion of measurement data is compensated by using the offset value, to improve a measurement credibility of a measurement object.

    摘要翻译: 示出了用于检查其上形成有测量对象的基板的基板检查装置。 基板检查方法包括测量其上形成有测量对象的基板,产生基板的平面方程,以及获取在基板上形成的测量对象的区域。 之后,通过考虑测量对象的高度,通过平面方程将测量对象的区域转换为基板平面。 然后,基于通过平面方程转换为衬底平面的测量对象的区域和通过参考数据的测量对象的区域来检查测量对象。 因此,根据基板的倾斜姿势获取测量对象的偏移值,并且通过使用偏移值来补偿测量数据的失真,以提高测量对象的测量可信度。

    Measurement apparatus and correction method of the same
    3.
    发明授权
    Measurement apparatus and correction method of the same 有权
    测量装置及其校正方法相同

    公开(公告)号:US09250071B2

    公开(公告)日:2016-02-02

    申请号:US13879539

    申请日:2011-10-13

    IPC分类号: G01C11/02 G01B11/06

    CPC分类号: G01C11/02 G01B11/0608

    摘要: A measurement apparatus for measuring a substrate, on which a measurement object is formed, and a correction method of the same is shown. The correction method includes measuring a reference phase by measuring a phase of a substrate for measuring the reference phase by using an image-capture part, acquiring a tilted pose of a reference plane of the measured reference phase to an image plane of the image-capture part, and calculating a height that is required to correct the reference plane with regard to the image-capture part based on the tilted pose. Therefore, based on a tilted pose of a reference phase in order to correct a reference plane being a reference of measuring a height, a measurement credibility of the measurement object may be improved.

    摘要翻译: 示出了用于测量其上形成有测量对象的基板的测量装置及其校正方法。 校正方法包括通过使用图像捕获部分测量基准相位的基板的相位来测量参考相位,将测量的基准相位的参考平面的倾斜姿态获取到图像捕获的图像平面 并且基于倾斜的姿势来计算相对于图像拍摄部分校正参考平面所需的高度。 因此,为了校正作为测量高度的基准的参考平面,基于参考相位的倾斜姿态,可以提高测量对象的测量可信度。

    MEASUREMENT APPARATUS AND CORRECTION METHOD OF THE SAME
    4.
    发明申请
    MEASUREMENT APPARATUS AND CORRECTION METHOD OF THE SAME 有权
    测量装置及其校正方法

    公开(公告)号:US20130222579A1

    公开(公告)日:2013-08-29

    申请号:US13879539

    申请日:2011-10-13

    IPC分类号: G01C11/02

    CPC分类号: G01C11/02 G01B11/0608

    摘要: A measurement apparatus for measuring a substrate, on which a measurement object is formed, and a correction method of the same is shown. The correction method includes measuring a reference phase by measuring a phase of a substrate for measuring the reference phase by using an image-capture part, acquiring a tilted pose of a reference plane of the measured reference phase to an image plane of the image-capture part, and calculating a height that is required to correct the reference plane with regard to the image-capture part based on the tilted pose. Therefore, based on a tilted pose of a reference phase in order to correct a reference plane being a reference of measuring a height, a measurement credibility of the measurement object may be improved.

    摘要翻译: 示出了用于测量其上形成有测量对象的基板的测量装置及其校正方法。 校正方法包括通过使用图像捕获部分测量基准相位的基板的相位来测量参考相位,将测量的基准相位的参考平面的倾斜姿态获取到图像捕获的图像平面 并且基于倾斜的姿势来计算相对于图像拍摄部分校正参考平面所需的高度。 因此,为了校正作为测量高度的基准的参考平面,基于参考相位的倾斜姿态,可以提高测量对象的测量可信度。