PLASMA GENERATING DEVICE
    1.
    发明申请
    PLASMA GENERATING DEVICE 审中-公开
    等离子体发生装置

    公开(公告)号:US20080272700A1

    公开(公告)日:2008-11-06

    申请号:US11939642

    申请日:2007-11-14

    IPC分类号: H05H1/00

    CPC分类号: H05H1/46 H01J37/3222

    摘要: In the present invention, a plasma generating device is provided for generating a plasma with a uniform intensity. The plasma generating device comprises at least a first antenna to transmit the first electromagnetic wave, at least a second antenna to transmit the second electromagnetic wave, and an insulator defining an isolated space for containing therein the first antenna and the second antenna, wherein the first antenna has an opposite orientation with respect to the second antenna, so that the first electromagnetic wave and the second electromagnetic wave are transmitted in opposite directions. The first and the second electromagnetic waves can be coupled with each other to produce a uniform standing wave pattern. Consequently, a large size uniform plasma can be generated.

    摘要翻译: 在本发明中,提供等离子体产生装置,用于产生具有均匀强度的等离子体。 等离子体产生装置至少包括用于传输第一电磁波的第一天线,至少第二天线以发射第二电磁波,以及限定用于容纳第一天线和第二天线的隔离空间的绝缘体,其中第一天线 天线相对于第二天线具有相反的方位,使得第一电磁波和第二电磁波在相反的方向上传输。 第一和第二电磁波可以彼此耦合以产生均匀的驻波图案。 因此,可以产生大尺寸均匀的等离子体。