公开(公告)号：US06789583B2

公开(公告)日：2004-09-14

申请号：US10353914

申请日：2003-01-30

Applicant: Junichi Tanaka ,  Takashi Orita ,  Makoto Echigojima

Inventor： Junichi Tanaka ,  Takashi Orita ,  Makoto Echigojima

IPC: F28F922

CPC classification number: F17C13/025 ,  F17C7/04 ,  F17C9/02 ,  F17C13/02 ,  F17C13/023 ,  F17C2221/035 ,  F17C2221/05 ,  F17C2223/0153 ,  F17C2223/033 ,  F17C2227/0309 ,  F17C2250/032 ,  F17C2250/0408 ,  F17C2250/0421 ,  F17C2250/043 ,  F17C2250/0443 ,  F17C2250/0495 ,  F17C2270/0518

Abstract: This gas supply apparatus supplies a gas by vaporizing a liquefied gas filled in a gas container. This apparatus includes an installation stand having an upper surface on which the gas container is placed; at least one nozzle which discharges a beating medium towards a bottom surface of the gas container and is provided in a hole formed in the installation stand; and a heating medium discharge path which discharges the heating medium from a space between the bottom surface of the gas container and the upper surface of the installation stand.

Abstract translation: 该气体供给装置通过使填充在气体容器中的液化气体蒸发而供给气体。 该装置包括具有上表面的安装台，放置有气体容器的上表面; 至少一个喷嘴，其向所述气体容器的底面排出打浆介质，并且设置在形成在所述安装台上的孔中; 以及从气体容器的底面和安装台的上表面之间的空间排出加热介质的加热介质排出路径。

公开(公告)号：US06966346B2

公开(公告)日：2005-11-22

申请号：US10920165

申请日：2004-08-18

Applicant: Junichi Tanaka ,  Takashi Orita ,  Makoto Echigojima

Inventor： Junichi Tanaka ,  Takashi Orita ,  Makoto Echigojima

IPC: F17C7/00 ,  C23C16/448 ,  F17C7/04 ,  F17C9/02 ,  F17C13/02 ,  F17C13/08 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  B65B1/04

CPC classification number: F17C13/025 ,  F17C7/04 ,  F17C9/02 ,  F17C13/02 ,  F17C13/023 ,  F17C2221/035 ,  F17C2221/05 ,  F17C2223/0153 ,  F17C2223/033 ,  F17C2227/0309 ,  F17C2250/032 ,  F17C2250/0408 ,  F17C2250/0421 ,  F17C2250/043 ,  F17C2250/0443 ,  F17C2250/0495 ,  F17C2270/0518

Abstract: This gas supply apparatus supplies a gas by vaporizing a liquefied gas filled in a gas container. This apparatus includes an installation stand having an upper surface on which the gas container is placed; at least one nozzle which discharges a heating medium towards a bottom surface of the gas container and is provided in a hole formed in the installation stand; and a heating medium discharge path which discharges the heating medium from a space between the bottom surface of the gas container and the upper surface of the installation stand.

公开(公告)号：US20050039815A1

公开(公告)日：2005-02-24

申请号：US10920165

申请日：2004-08-18

Applicant: Junichi Tanaka ,  Takashi Orita ,  Makoto Echigojima

Inventor： Junichi Tanaka ,  Takashi Orita ,  Makoto Echigojima

IPC: F17C7/00 ,  C23C16/448 ,  F17C7/04 ,  F17C9/02 ,  F17C13/02 ,  F17C13/08 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  B65B1/04

CPC classification number: F17C13/025 ,  F17C7/04 ,  F17C9/02 ,  F17C13/02 ,  F17C13/023 ,  F17C2221/035 ,  F17C2221/05 ,  F17C2223/0153 ,  F17C2223/033 ,  F17C2227/0309 ,  F17C2250/032 ,  F17C2250/0408 ,  F17C2250/0421 ,  F17C2250/043 ,  F17C2250/0443 ,  F17C2250/0495 ,  F17C2270/0518

Abstract: This gas supply apparatus supplies a gas by vaporizing a liquefied gas filled in a gas container. This apparatus includes an installation stand having an upper surface on which the gas container is placed; at least one nozzle which discharges a heating medium towards a bottom surface of the gas container and is provided in a hole formed in the installation stand; and a heating medium discharge path which discharges the heating medium from a space between the bottom surface of the gas container and the upper surface of the installation stand.

Abstract translation: 该气体供给装置通过使填充在气体容器中的液化气体蒸发而供给气体。 该装置包括具有上表面的安装台，放置有气体容器的上表面; 至少一个喷嘴，其向所述气体容器的底面排出加热介质，并且设置在形成在所述安装台中的孔中; 以及从气体容器的底面和安装台的上表面之间的空间排出加热介质的加热介质排出路径。