公开(公告)号：US20230260806A1

公开(公告)日：2023-08-17

申请号：US18012685

申请日：2021-05-28

Applicant: KCTECH CO., LTD.

Inventor： Dong Hwa LEE ,  Hyung Chul KIM ,  You Sun JUNG

IPC: H01L21/67 ,  H01L21/02 ,  H01L21/66

CPC classification number: H01L21/67034 ,  H01L21/02068 ,  H01L21/6715 ,  H01L22/12 ,  H01L21/6719 ,  H01L21/67178

Abstract: A substrate processing system, according to one embodiment, comprises: a cleaning device, positioned at a first position, for performing a cleaning process for a substrate; a drying device, positioned at a second position, for performing a drying process for the substrate; and a transfer unit for transferring the substrate from the cleaning device to the drying device, wherein the first position and the second position may be vertically arranged.

公开(公告)号：US20230001462A1

公开(公告)日：2023-01-05

申请号：US17781700

申请日：2020-11-05

Applicant: KCTECH CO., LTD.

Inventor： Hyung Chul KIM ,  Dong Hwa LEE ,  You Sun JUNG

IPC: B08B13/00 ,  B08B7/00

Abstract: The substrate processing device according to one embodiment may comprise: a chamber unit provided with a processing space therein and comprising an inclined chamber surface having an opening; a door unit comprising an inclined door surface, which corresponds to the inclined chamber surface, and capable of being coupled to the chamber unit; and a door driving unit for driving the door unit so as to open/close the processing space.