公开(公告)号：US12133318B2

公开(公告)日：2024-10-29

申请号：US18091994

申请日：2022-12-30

Applicant: KLA Corporation

Inventor： Alexander Bykanov ,  Rui-Fang Shi

IPC: H05G2/00

CPC classification number: H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes a porous region. The rotating target assembly is rotated to form a target by centrifugal force with a layer of molten metal on a distal wall of an annular groove in the rotating target assembly.

公开(公告)号：US11343899B2

公开(公告)日：2022-05-24

申请号：US17102256

申请日：2020-11-23

Applicant: KLA Corporation

Inventor： Brian Ahr ,  Alexander Bykanov ,  Rudy F. Garcia ,  Layton Hale ,  Oleg Khodykin

IPC: H05G2/00

Abstract: The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed.

公开(公告)号：US11635700B2

公开(公告)日：2023-04-25

申请号：US17210185

申请日：2021-03-23

Applicant: KLA Corporation

Inventor： Erel Milshtein ,  Alexander Bykanov ,  Konstantin Tsigutkin ,  Lauren Wilson ,  Lubomyr Kucher ,  Brian Ahr ,  Maksim Alexandrovich Deminskii ,  Leonid Borisovich Zvedenuk ,  Aleksandr Vladimirovich Lebedev ,  Andrey Evgenievich Stepanov

IPC: G03F7/20

Abstract: A method for producing a protective buffer flow in an EUV light source and an EUV mask inspection apparatus are provided. The method includes directing light along a light path from the EUV light source toward a collector. A first buffer gas from a buffer gas injector is injected through a plurality of through holes in the collector. The first buffer gas is directed away from a surface of the collector. A second buffer gas is injected from a ring manifold arranged peripherally to the collector and arranged a first distance toward the light path in relation to the collector. The second buffer gas is directed away from the surface of the collector. The first distance corresponds to a distance from the collector where the first buffer gas merges into a single flow.

公开(公告)号：US20220260928A1

公开(公告)日：2022-08-18

申请号：US17210185

申请日：2021-03-23

Applicant: KLA Corporation

Inventor： Erel Milshtein ,  Alexander Bykanov ,  Konstantin Tsigutkin ,  Lauren Wilson ,  Lubomyr Kucher ,  Brian Ahr ,  Maksim Alexandrovich Deminskii ,  Leonid Borisovich Zvedenuk ,  Aleksandr Vladimirovich Lebedev ,  Andrey Evgenievich Stepanov

IPC: G03F7/20

Abstract: A method for producing a protective buffer flow in an EUV light source and an EUV mask inspection apparatus are provided. The method includes directing light along a light path from the EUV light source toward a collector. A first buffer gas from a buffer gas injector is injected through a plurality of through holes in the collector. The first buffer gas is directed away from a surface of the collector. A second buffer gas is injected from a ring manifold arranged peripherally to the collector and arranged a first distance toward the light path in relation to the collector. The second buffer gas is directed away from the surface of the collector. The first distance corresponds to a distance from the collector where the first buffer gas merges into a single flow.

公开(公告)号：US20230403778A1

公开(公告)日：2023-12-14

申请号：US18091994

申请日：2022-12-30

Applicant: KLA Corporation

Inventor： Alexander Bykanov ,  Rui-Fang Shi

IPC: H05G2/00

CPC classification number: H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes a porous region. The rotating target assembly is rotated to form a target by centrifugal force with a layer of molten metal on a distal wall of an annular groove in the rotating target assembly.

公开(公告)号：US20210105886A1

公开(公告)日：2021-04-08

申请号：US17102256

申请日：2020-11-23

Applicant: KLA Corporation

Inventor： Brian Ahr ,  Alexander Bykanov ,  Rudy F. Garcia ,  Layton Hale ,  Oleg Khodykin

IPC: H05G2/00

Abstract: The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed.