公开(公告)号：US11635700B2

公开(公告)日：2023-04-25

申请号：US17210185

申请日：2021-03-23

Applicant: KLA Corporation

Inventor： Erel Milshtein ,  Alexander Bykanov ,  Konstantin Tsigutkin ,  Lauren Wilson ,  Lubomyr Kucher ,  Brian Ahr ,  Maksim Alexandrovich Deminskii ,  Leonid Borisovich Zvedenuk ,  Aleksandr Vladimirovich Lebedev ,  Andrey Evgenievich Stepanov

IPC: G03F7/20

Abstract: A method for producing a protective buffer flow in an EUV light source and an EUV mask inspection apparatus are provided. The method includes directing light along a light path from the EUV light source toward a collector. A first buffer gas from a buffer gas injector is injected through a plurality of through holes in the collector. The first buffer gas is directed away from a surface of the collector. A second buffer gas is injected from a ring manifold arranged peripherally to the collector and arranged a first distance toward the light path in relation to the collector. The second buffer gas is directed away from the surface of the collector. The first distance corresponds to a distance from the collector where the first buffer gas merges into a single flow.

公开(公告)号：US20220260928A1

公开(公告)日：2022-08-18

申请号：US17210185

申请日：2021-03-23

Applicant: KLA Corporation

Inventor： Erel Milshtein ,  Alexander Bykanov ,  Konstantin Tsigutkin ,  Lauren Wilson ,  Lubomyr Kucher ,  Brian Ahr ,  Maksim Alexandrovich Deminskii ,  Leonid Borisovich Zvedenuk ,  Aleksandr Vladimirovich Lebedev ,  Andrey Evgenievich Stepanov

IPC: G03F7/20

Abstract: A method for producing a protective buffer flow in an EUV light source and an EUV mask inspection apparatus are provided. The method includes directing light along a light path from the EUV light source toward a collector. A first buffer gas from a buffer gas injector is injected through a plurality of through holes in the collector. The first buffer gas is directed away from a surface of the collector. A second buffer gas is injected from a ring manifold arranged peripherally to the collector and arranged a first distance toward the light path in relation to the collector. The second buffer gas is directed away from the surface of the collector. The first distance corresponds to a distance from the collector where the first buffer gas merges into a single flow.