公开(公告)号：US20240255448A1

公开(公告)日：2024-08-01

申请号：US18160989

申请日：2023-01-27

Applicant: KLA Corporation

Inventor： Siqing Nie ,  Chunwei Song ,  Chaoqing Wang ,  Weifeng Zhou ,  Xiaochun Li

IPC: G01N23/2251 ,  G01N21/95

CPC classification number: G01N23/2251 ,  G01N21/9501 ,  G01N2223/07 ,  G01N2223/6116 ,  G01N2223/646

Abstract: Methods and systems for detecting defects in an array region on a specimen are provided. One system includes an inspection subsystem configured for generating output responsive to patterned features formed in an array region on a specimen. The system also includes a computer subsystem configured for determining if a pitch of the patterned features in the output is an integer of pixels in a detector of the inspection subsystem that generated the output. When the pitch is not an integer of the pixels, the computer subsystem is configured for interpolating the output to generate interpolated output having a modified pitch of the patterned features in the interpolated output that is an integer of the pixels. The computer subsystem is also configured for detecting defects in the array region by applying a defect detection method to the interpolated output.