公开(公告)号：US20220382046A1

公开(公告)日：2022-12-01

申请号：US17333717

申请日：2021-05-28

申请人： KLA Corporation

发明人： Rudy F. Garcia ,  Michael Lang ,  Ravichandra Jagannath

IPC分类号： G02B27/00 ,  G21K1/06

摘要： Systems and methods for mitigating and reducing contamination of one or more components of overlay inspection systems are disclosed. Specifically, embodiments of the present disclosure may utilize a counterflow of purge gas through a counterflow nozzle to reduce the presence of contaminants within one or more portions of an inspection system. The system may include a source chamber, one or more vacuum chambers, an intermediate focus housing having an aperture, an illumination source configured to generate and direct illumination through the aperture in an illumination direction, and a counterflow nozzle configured to direct a counterflow of purge gas into the source chamber in a direction opposite the illumination direction.