公开(公告)号：US11295432B2

公开(公告)日：2022-04-05

申请号：US15969229

申请日：2018-05-02

Applicant: KLA-TENCOR CORPORATION

Inventor： Kaushik Reddy Vemareddy ,  Shishir Suman ,  Pavan Kumar Perali

IPC: G06T7/00 ,  G06T5/00

Abstract: A noise map is used for defect detection. One or more measurements of intensities at one or more pixels are received and an intensity statistic is determined for each measurement. The intensity statistics are grouped into at least one region and stored with at least one alignment target. A wafer can be inspected with a wafer inspection tool using the noise map. The noise map can be used as a segmentation mask to suppress noise.

公开(公告)号：US20190005638A1

公开(公告)日：2019-01-03

申请号：US15969229

申请日：2018-05-02

Applicant: KLA-TENCOR CORPORATION

Inventor： Kaushik Reddy Vemareddy ,  Shishir Suman ,  Pavan Kumar Perali

IPC: G06T7/00 ,  G06T5/00

Abstract: A noise map is used for defect detection. One or more measurements of intensities at one or more pixels are received and an intensity statistic is determined for each measurement. The intensity statistics are grouped into at least one region and stored with at least one alignment target. A wafer can be inspected with a wafer inspection tool using the noise map. The noise map can be used as a segmentation mask to suppress noise.