公开(公告)号：US10168273B1

公开(公告)日：2019-01-01

申请号：US15795089

申请日：2017-10-26

Applicant: KLA-Tencor Corporation

Inventor： Haifeng Huang ,  Rui-Fang Shi ,  Damon F. Kvamme ,  Amrish Kelkar

IPC: G01J4/00 ,  G01N21/21 ,  G01N21/956

Abstract: Disclosed are methods and apparatus for measuring and controlling polarization for inspection of a semiconductor sample. The method includes (i) setting up an inspection system in a specific mode of operation, (ii) incrementing a first waveplate of the system through a plurality of rotations while keeping a second waveplate of the system static, (iii) measuring an intensity signal from non-patterned areas of the sample for each rotation of the first waveplate, (iv) incrementing the second waveplate through a plurality of rotations while keeping the first waveplate static (v) measuring an intensity signal from non-patterned areas of the sample for each rotation of the second waveplate, (vi) generating a model of a plurality of polarization and waveplate parameters for the system to simulate the intensity signals that were measured for each rotation of the first and/or second waveplate, and (vii) determining the polarization and waveplate parameters for the system based on the model and a polarization state on photomask plane based on the polarization and waveplate parameters.

公开(公告)号：US20190003960A1

公开(公告)日：2019-01-03

申请号：US15795089

申请日：2017-10-26

Applicant: KLA-Tencor Corporation

Inventor： Haifeng Huang ,  Rui-Fang Shi ,  Damon F. Kvamme ,  Amrish Kelkar

IPC: G01N21/21 ,  G01N21/956

Abstract: Disclosed are methods and apparatus for measuring and controlling polarization for inspection of a semiconductor sample. The method includes (i) setting up an inspection system in a specific mode of operation, (ii) incrementing a first waveplate of the system through a plurality of rotations while keeping a second waveplate of the system static, (iii) measuring an intensity signal from non-patterned areas of the sample for each rotation of the first waveplate, (iv) incrementing the second waveplate through a plurality of rotations while keeping the first waveplate static (v) measuring an intensity signal from non-patterned areas of the sample for each rotation of the second waveplate, (vi) generating a model of a plurality of polarization and waveplate parameters for the system to simulate the intensity signals that were measured for each rotation of the first and/or second waveplate, and (vii) determining the polarization and waveplate parameters for the system based on the model and a polarization state on photomask plane based on the polarization and waveplate parameters.