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Patent Agency Ranking
公开(公告)号：US10168273B1
公开(公告)日：2019-01-01
申请号：US15795089
申请日：2017-10-26
Applicant: KLA-Tencor Corporation
Inventor： Haifeng Huang , Rui-Fang Shi , Damon F. Kvamme , Amrish Kelkar
IPC: G01J4/00 , G01N21/21 , G01N21/956
Abstract: Disclosed are methods and apparatus for measuring and controlling polarization for inspection of a semiconductor sample. The method includes (i) setting up an inspection system in a specific mode of operation, (ii) incrementing a first waveplate of the system through a plurality of rotations while keeping a second waveplate of the system static, (iii) measuring an intensity signal from non-patterned areas of the sample for each rotation of the first waveplate, (iv) incrementing the second waveplate through a plurality of rotations while keeping the first waveplate static (v) measuring an intensity signal from non-patterned areas of the sample for each rotation of the second waveplate, (vi) generating a model of a plurality of polarization and waveplate parameters for the system to simulate the intensity signals that were measured for each rotation of the first and/or second waveplate, and (vii) determining the polarization and waveplate parameters for the system based on the model and a polarization state on photomask plane based on the polarization and waveplate parameters.
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公开(公告)号：US20160093040A1
公开(公告)日：2016-03-31
申请号：US14890880
申请日：2014-05-14
Applicant: KLA-TENCOR CORPORATION
Inventor： Weston L. Sousa , Yalin Xiong , Rui-Fang Shi
CPC classification number: G01N21/8851 , G01N21/94 , G01N21/956 , G01N21/95607 , G01N2021/558 , G01N2021/8867 , G01N2021/95676 , G01N2201/12 , G03F1/84 , G06T7/0004 , G06T7/001 , G06T7/10 , G06T7/136 , G06T2207/30148
Abstract: Methods and systems for integrated multi-pass reticle inspection are provided. One method for inspecting a reticle includes acquiring at least first, second, and third images for the reticle. The first image is a substantially high resolution image of light transmitted by the reticle. The second image is a substantially high resolution image of light reflected from the reticle. The third image is an image of light transmitted by the reticle that is acquired with a substantially low numerical aperture. The method also includes detecting defects on the reticle using at least the first, second, and third images for the reticle in combination.
Abstract translation: 提供了综合多通道掩模检测的方法和系统。 用于检查掩模版的一种方法包括获取用于掩模版的至少第一，第二和第三图像。 第一个图像是由光罩传输的光的基本上高分辨率的图像。 第二个图像是从掩模版反射的光的基本上高分辨率的图像。 第三图像是由具有基本上低的数值孔径获得的掩模版传输的光的图像。 该方法还包括组合使用至少第一，第二和第三图像来检测掩模版上的缺陷。
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公开(公告)号：US20190003960A1
公开(公告)日：2019-01-03
申请号：US15795089
申请日：2017-10-26
Applicant: KLA-Tencor Corporation
Inventor： Haifeng Huang , Rui-Fang Shi , Damon F. Kvamme , Amrish Kelkar
IPC: G01N21/21 , G01N21/956
Abstract: Disclosed are methods and apparatus for measuring and controlling polarization for inspection of a semiconductor sample. The method includes (i) setting up an inspection system in a specific mode of operation, (ii) incrementing a first waveplate of the system through a plurality of rotations while keeping a second waveplate of the system static, (iii) measuring an intensity signal from non-patterned areas of the sample for each rotation of the first waveplate, (iv) incrementing the second waveplate through a plurality of rotations while keeping the first waveplate static (v) measuring an intensity signal from non-patterned areas of the sample for each rotation of the second waveplate, (vi) generating a model of a plurality of polarization and waveplate parameters for the system to simulate the intensity signals that were measured for each rotation of the first and/or second waveplate, and (vii) determining the polarization and waveplate parameters for the system based on the model and a polarization state on photomask plane based on the polarization and waveplate parameters.
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公开(公告)号：US09778207B2
公开(公告)日：2017-10-03
申请号：US14890880
申请日：2014-05-14
Applicant: KLA-Tencor Corporation
Inventor： Weston L. Sousa , Yalin Xiong , Rui-Fang Shi
IPC: G01N21/88 , G03F1/84 , G06T7/00 , G01N21/956
CPC classification number: G01N21/8851 , G01N21/94 , G01N21/956 , G01N21/95607 , G01N2021/558 , G01N2021/8867 , G01N2021/95676 , G01N2201/12 , G03F1/84 , G06T7/0004 , G06T7/001 , G06T7/10 , G06T7/136 , G06T2207/30148
Abstract: Methods and systems for integrated multi-pass reticle inspection are provided. One method for inspecting a reticle includes acquiring at least first, second, and third images for the reticle. The first image is a substantially high resolution image of light transmitted by the reticle. The second image is a substantially high resolution image of light reflected from the reticle. The third image is an image of light transmitted by the reticle that is acquired with a substantially low numerical aperture. The method also includes detecting defects on the reticle using at least the first, second, and third images for the reticle in combination.
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公开(公告)号：US20170256043A9
公开(公告)日：2017-09-07
申请号：US14890880
申请日：2014-05-14
Applicant: KLA-TENCOR CORPORATION
Inventor： Weston L. Sousa , Yalin Xiong , Rui-Fang Shi
CPC classification number: G01N21/8851 , G01N21/94 , G01N21/956 , G01N21/95607 , G01N2021/558 , G01N2021/8867 , G01N2021/95676 , G01N2201/12 , G03F1/84 , G06T7/0004 , G06T7/001 , G06T7/10 , G06T7/136 , G06T2207/30148
Abstract: Methods and systems for integrated multi-pass reticle inspection are provided. One method for inspecting a reticle includes acquiring at least first, second, and third images for the reticle. The first image is a substantially high resolution image of light transmitted by the reticle. The second image is a substantially high resolution image of light reflected from the reticle. The third image is an image of light transmitted by the reticle that is acquired with a substantially low numerical aperture. The method also includes detecting defects on the reticle using at least the first, second, and third images for the reticle in combination.
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