Enhanced defect detection in electron beam inspection and review
    1.
    发明授权
    Enhanced defect detection in electron beam inspection and review 有权
    电子束检测和检查中增强的缺陷检测

    公开(公告)号:US09449788B2

    公开(公告)日:2016-09-20

    申请号:US14300631

    申请日:2014-06-10

    Abstract: One embodiment relates to an electron beam apparatus for inspection and/or review. An electron source generates a primary electron beam, and an electron-optics system shapes and focuses said primary electron beam onto a sample held by a stage. A detection system detects signal-carrying electrons including secondary electrons and back-scattered electrons from said sample, and an image processing system processes data from said detection system. A host computer system that controls and coordinates operations of the electron-optics system, the detection system, and the image processing system. A graphical user interface shows a parameter space and provides for user selection and activation of operating parameters of the apparatus. Another embodiment relates to a method for detecting and/or reviewing defects using an electron beam apparatus. Other embodiments, aspects and features are also disclosed.

    Abstract translation: 一个实施例涉及用于检查和/或审查的电子束装置。 电子源产生一次电子束,并且电子 - 光学系统将所述一次电子束形成并聚焦在由载物台保持的样品上。 检测系统检测来自所述样品的包含二次电子和反向散射电子的信号携带电子,并且图像处理系统处理来自所述检测系统的数据。 控制和协调电子光学系统,检测系统和图像处理系统的主机计算机系统。 图形用户界面显示参数空间,并提供用户选择和激活设备的操作参数。 另一实施例涉及使用电子束装置检测和/或检查缺陷的方法。 还公开了其它实施例,方面和特征。

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