公开(公告)号：US12106932B2

公开(公告)日：2024-10-01

申请号：US17617624

申请日：2019-06-13

Applicant: DECTRIS AG

Inventor： Radosav Pantelic ,  Vittorio Boccone

IPC: H01J37/26

CPC classification number: H01J37/261 ,  H01J2237/026 ,  H01J2237/2802

Abstract: An electron detector comprises a sensor module comprising a sensor for detecting electrons, and an electronics module comprising circuitry for processing signals received from the sensor module. Wiring is provided for electrically connecting the sensor module to the electronics module. An adaptor is arranged between the sensor module and the electronics module. The adaptor comprises a passage for the wiring, and shielding elements for shielding from radiation.

公开(公告)号：US20240128048A1

公开(公告)日：2024-04-18

申请号：US18393170

申请日：2023-12-21

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Ingo Mueller ,  Nicolas Kaufmann ,  Michael Behnke ,  Hans Fritz

IPC: H01J37/24 ,  H01J37/12 ,  H01J37/26

CPC classification number: H01J37/243 ,  H01J37/12 ,  H01J37/261 ,  H01J2237/0435 ,  H01J2237/24564

Abstract: A method for operating a multi-beam particle microscope which operates using a plurality of individual charged particle beams, wherein the method includes the following steps: measuring the beam current; determining a deviation of the measured beam current from a nominal beam current; decomposing the determined deviation into a drift component and into a high-frequency component; and controlling the high-frequency component of the beam current via a first closed-loop beam current control mechanism and/or compensating an effect of the high-frequency component on a recording quality of the multi-beam particle microscope using different mechanism than a closed-loop beam current control mechanism. An electrostatic control lens arranged in the beam generating system between extractor and anode can be used as first closed-loop beam current control mechanism. Adapting an extractor voltage of the beam generating system can be avoided.

公开(公告)号：US20240105417A1

公开(公告)日：2024-03-28

申请号：US18202155

申请日：2023-05-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yeoseon Choi ,  Donghoon Kwon

IPC: H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J2237/2007

Abstract: A sample holder includes a head, a first holding plate extending in a first direction from one surface of the head and including at least one first sample hole configured to accommodate at least one first sample and a first main surface configured such that the at least one first sample accommodated in the at least one first sample hole is exposed at the first main surface, and a second holding plate extending in the first direction from the one surface of the head and including at least one second sample hole configured to accommodate at least one second sample and a second main surface configured such that the at least one second sample accommodated in the at least one second sample hole is exposed at the second main surface, wherein a direction perpendicular to the first main surface of the first holding plate differs from a direction perpendicular to the second main surface of the second holding plate.

公开(公告)号：US20180240645A1

公开(公告)日：2018-08-23

申请号：US15440111

申请日：2017-02-23

Applicant: Hermes Microvision Inc.

Inventor： HSUAN-BIN HUANG ,  CHUN-LIANG LU ,  CHIN-FA TU ,  WEN-SHENG LIN ,  YOU-JIN WANG

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/20 ,  G01B11/00

CPC classification number: H01J37/261 ,  G01B11/00 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/20292 ,  H01J2237/28 ,  H01L21/67201 ,  H01L21/67265 ,  H01L21/67766

Abstract: A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.

公开(公告)号：US10054557B2

公开(公告)日：2018-08-21

申请号：US15329902

申请日：2015-07-29

Applicant: Oxford Instruments Nanotechnology Tools Limited

Inventor： Peter Statham

IPC: H01J37/26 ,  G01N23/2252

CPC classification number: G01N23/2252 ,  G01N2223/304 ,  G01N2223/633 ,  H01J37/261 ,  H01J2237/24578

Abstract: A method is provided of measuring the mass thickness of a target sample for use in electron microscopy. Reference data are obtained which is representative of the X-rays (28) generated within a reference sample (12) when a particle beam (7) is caused to impinge upon a region (14) of the reference sample (12). The region (14) is of a predetermined thickness of less than 300 nm and has a predetermined composition. The particle beam (7) is caused to impinge upon a region (18) of the target sample (16). The resulting X-rays (29) generated within the target sample (16) are monitored (27) so as to produce monitored data. Output data are then calculated based upon the monitored data and the reference data, the output data including the mass thickness of the region (18) of the target sample (16).

公开(公告)号：US09984850B2

公开(公告)日：2018-05-29

申请号：US15051210

申请日：2016-02-23

Applicant: PROTOCHIPS, INC.

Inventor： John Damiano, Jr. ,  Stephen E. Mick ,  David P. Nackashi

IPC: H01J37/26 ,  H01J37/20

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J37/261 ,  H01J2237/188 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2602 ,  H01J2237/28 ,  H01J2237/2802

Abstract: Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.

公开(公告)号：US09952128B2

公开(公告)日：2018-04-24

申请号：US15285070

申请日：2016-10-04

Applicant: The Scripps Research Institute

Inventor： Bridget Carragher ,  Clinton S. Potter ,  Tilak Jain

IPC: G01N1/28 ,  G01N1/30 ,  G01N1/31 ,  H01J37/20 ,  H01J37/26

CPC classification number: G01N1/28 ,  G01N1/30 ,  G01N1/31 ,  G01N1/312 ,  H01J37/20 ,  H01J37/261 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/2602

Abstract: The invention provides systems or apparatuses for dispensing aqueous materials for electron microscopy (EM). The systems allow dispensing of aqueous materials onto an EM sample grid at individual specimen locations in an ordered array of specimen locations, with each individual specimen location in the array of locations. The systems contain a holder for reversibly receiving an EM sample grid, and a dispenser containing one or more dispensing elements that are configured to discretely dispense one or more aqueous solutions from the dispensing elements onto a plurality of individual specimen locations. The dispenser is able to provide an ordered array of discrete specimen locations discontinuous with one another. In the systems, at least one dispensing element is configured to dispense picoliter volumes of one or more of the aqueous solutions. Additionally, the systems contain a drive mechanism to position the EM sample grid relative to the one or more dispensing elements, as well as one or more reservoirs operably linked to the dispenser for holding the one or more aqueous solutions to be discretely dispensed onto each individual specimen location in the array of locations.

公开(公告)号：US09941094B1

公开(公告)日：2018-04-10

申请号：US15422454

申请日：2017-02-01

Applicant: FEI Company

Inventor： Leon van Kouwen ,  Gerard Nicolaas Anne van Veen

IPC: H01J37/08 ,  H01J37/147 ,  H01J37/26

CPC classification number: H01J37/08 ,  H01J37/147 ,  H01J37/261

Abstract: A source assembly for producing an ion beam and comprising a collision ionization ion source having: A pair of stacked plates, sandwiched about an intervening gap; An ionization space between said plates, connected to a gas supply duct; An input zone, provided in a first of said plates, to admit an input beam of charged particles to said ionization space; An output aperture, located opposite said input zone and provided in the second of said plates, to allow emission of a flux of ions produced in said ionization space by said input beam, which source assembly comprises: A carrier provided with a plurality of different collision ionization ion sources that mutually differ in respect of a gap height d between said plates; A selecting device, which allows a given one of said ion sources to be individually selected for production of said ion beam. The various sources in said plurality preferably have a scattering quotient QS=d/li with a value in a range 1-500, preferably in a range 1-200, where li is an ionic mean free path length in said ionization space.

公开(公告)号：US09711325B2

公开(公告)日：2017-07-18

申请号：US14257742

申请日：2014-04-21

Applicant: FEI Company

Inventor： Faysal Boughorbel ,  Eric Gerardus Theodoor Bosch ,  Pavel Potocek ,  Xiaodong Zhuge ,  Berend Helmerus Lich

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/22 ,  G01N1/06 ,  G01N1/36 ,  G01N23/225

CPC classification number: H01J37/222 ,  G01N1/06 ,  G01N1/36 ,  G01N23/225 ,  G01N2223/401 ,  G01N2223/418 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/206 ,  H01J2237/208 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/31745

Abstract: A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; using a detector arrangement to detect at least a portion of said emitted radiation, the method of which comprises embodying the detector arrangement to detect electrons in the emitted radiation; recording an output On of said detector arrangement as a function of kinetic energy En of said electrons, thus compiling a measurement set M={(On, En)} for a plurality of values of En; using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set R={(Vk, Lk)}, in which a spatial variable V demonstrates a value Vk at an associated discrete depth level Lk referenced to the surface S, whereby n and k are members of an integer sequence, and spatial variable V represents a physical property of the sample as a function of position in its bulk.

公开(公告)号：US09679738B2

公开(公告)日：2017-06-13

申请号：US14916529

申请日：2014-05-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroaki Matsumoto ,  Takeshi Sato ,  Yoshifumi Taniguchi ,  Ken Harada

IPC: H01J47/00 ,  H01J37/10 ,  H01J37/295 ,  H01J37/04 ,  H01J37/26 ,  G01N23/20 ,  H01J37/09 ,  H01J37/147 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/28 ,  H01J37/05 ,  H01J37/285

CPC classification number: H01J37/10 ,  G01N23/20058 ,  G01N2223/418 ,  H01J37/04 ,  H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J37/285 ,  H01J37/295 ,  H01J2237/21 ,  H01J2237/2614

Abstract: The present invention relates to a lens-less Foucault method wherein a transmission electron microscope objective lens (5) is turned off, an electron beam crossover (11, 13) is matched with a selected area aperture (65), and the focal distance of a first imaging lens (61) can be changed to enable switching between a sample image observation mode and a sample diffraction pattern observation mode, characterized in that a deflector (81) is disposed in a stage following the first imaging lens (61), and conditions for an irradiating optical system (4) can be fixed after conditions for the imaging optical system have been determined. This allows a lens-less Foucault method to be implemented in a common general-use transmission electron microscope with no magnetic shielding lens equipped, without burdening the operator.